Effect of Ambient Gas to Growth of SiO2 Nanowires by Vapor Evaporation Method |
Rho Dae-Ho
(Korea University, Department of Materials Science and Engineering)
Kim Jae-Soo (Korea Institute of Science and Technology, Metal Processing Research Center) Byun Dong-Jin (Korea University, Department of Materials Science and Engineering) Lee Jae-Hoon (Korea Institute of Industrial Technology, Advanced Materials Center) Yang Jae-Woong (Dajin University, Department of Advanced Materials Science and Technology) Kim Na-Ri (Korea University, Department of Materials Science and Engineering) |
1 | J, Niu, J. Sha, N. Zhang, Y. Ji, X. Ma and D. Yang, Physica E, 23, 1 (2004) DOI ScienceOn |
2 | H. Nishikawa, T. Shrioyama, R. Nakamura, Y. Ohiki, K. Nagaswa and Y. Hama, Phys. Rev., B 45, 586 (1992) DOI ScienceOn |
3 | B. K. Teo, C. P. Li, X. H. Sun, N. B. Wong and S. T. Lee, Inorg. Chem., 42, 6723 (2003) DOI ScienceOn |
4 | J. J. Wu, T. C. Weng and C. C, Yu, Adv. Mater., 14, 1643 (2002) DOI ScienceOn |
5 | D. D. D. Ma, C. S. Lee, F.C. K. Au, S.Y. Tong and S. Y. Lee, Science, 299, 1874 (2003) DOI ScienceOn |
6 | D. H. Rho, J. S. Kim, D. J. Byun, J. W. Yang and N. R. Kim, Kor. J. Mater. Res., 13, 677 (2003) 과학기술학회마을 DOI |
7 | B. C. Satishkimar, P. J.Tomas, A. Govindaraj and C. N. R. Rao, Appl. Phys. Lett., 77, 2530 (2000) DOI ScienceOn |
8 | B. K. Teo, C. P. Li, X. H. Sun, N. B. Wong and S. T. Lee, Inorg. Chem., 42, 6723 (2003) DOI ScienceOn |
9 | Q. Hu, G. Li, H. Suzuki, H. Araki, N. Ishikawa, W. Yang and T. Noda, J. Cryst. Gr., 246, 64 (2002) DOI ScienceOn |
10 | K. M. Knowels and M. V. Ravichandran, J. Am. Ceram. Soc., 80, 1165 (1997) DOI ScienceOn |
11 | Y. Yao, S. T. Lee and F. H. Li, Chem. l Phys. Lett., 381, 628 (2003) DOI ScienceOn |
12 | S. R. Nutt, J. Am. Ceram. Soc., 71, 149 (1988) DOI ScienceOn |
13 | X. Chen, C. Au, J. Lin, X. Wang and Y. Qian, J. Cryst. Gr., 253, 357 (2003) DOI ScienceOn |
14 | Y. Dai, Y. Zhang, Y. Q. bai and Z. L. Wang, Chem. Phys. Lett., 375, 96 (2003) DOI ScienceOn |
15 | H. Takikawa, M. Yatsuki and T. Sakakibara, Jpn. J. Appl. Phys., 38, L401 (1999) DOI |
16 | Z. W. Pan, Z. R. Dai, C. Ma and Z. L. wang, J. Am. Chem. Soc., 124, 1817 (2002) DOI ScienceOn |
17 | E. I. Givargizov, J. Cryst. Gr., 31, 20 (1975) DOI ScienceOn |
18 | D. H. Rho, J. S. Kim, D. J. Byun, J. W. Yang and N. R. Kim, Kor. J. Mater. Res., 13, 404 (2003) 과학기술학회마을 DOI |
19 | D. P. Yu, Q. L. Hong, Y. Ding, H. Z. Zhang, Z. G. Bai, J. J. wang, Y. H. Zou, W. Qian, G. G. Xiong and S. Q. Feng, Appl. Phys. Lett., 73, 3076 (1988) DOI |
20 | T. V. Tirchnska, M. M. Rodriquez and L. Y. Khomenkova, Surface Science, 532, 1204 (2003) DOI ScienceOn |
21 | X. C. Wu, W. H. Song, K. Y. Wang, T. Hu, B. Zhao, Y. P. Sun and J. J. Du, Chem. Phys. Lett., 336(1), 53 (2001) DOI ScienceOn |
22 | D. H. Rho, J. S. Kim, D. J. Byun, J. H. Lee, J. W. Yang and N. R. Kim, Kor. J. Mater. Res., 14, 482 (2004) 과학기술학회마을 DOI |
23 | Z. L. Wang, R. P. Ga, Z. L. Gole and J. D. Stout. Adv, Mater., 12, 1938 (2000) DOI ScienceOn |
24 | T. V. Tirchnska, M. M. Rodriquez, A. V. Hemadez and K. W. Cheah, J. Luminescence, 102, 551 (2003) DOI ScienceOn |