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http://dx.doi.org/10.3740/MRSK.2005.15.12.818

Preparation of Ceria Coated Silica Abrasive by Hydrothermal Treatment and Polishing Rate on Oxide Film  

Ryu Dae Sun (Composite Materials Center, Korea Institute of Ceramic Eng. & Tech.,)
Kim Dae Sung (Composite Materials Center, Korea Institute of Ceramic Eng. & Tech.,)
Lee Seung-Ho (Composite Materials Center, Korea Institute of Ceramic Eng. & Tech.,)
Publication Information
Korean Journal of Materials Research / v.15, no.12, 2005 , pp. 818-823 More about this Journal
Abstract
Sub-micron colloidal silica particles coated with nano-sized ceria were prepared by mixing of its silica and cerium salts hydrolysis, and modified by hydrothermal reaction. By using the slurries with and without hydrothermal modification containing above particles, oxide film coated on silicon wafer was polished. The modified slurries had higher polish rate due to increase of ceria fraction to silica through hydrothermal reaction. They revealed higher stability in wide range of pH $2\~10$ than ceria coated silica slurries without its modification.
Keywords
ceria coated silica; hydrothermal treatment; CMP; abrasive; nano-sized ceria;
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Times Cited By KSCI : 1  (Citation Analysis)
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