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http://dx.doi.org/10.3740/MRSK.2004.14.9.670

Optical Properties of Bi2O3-ZnO-SiO2 Glass System for Transparent Dielectric  

Jun J. S. (School of Materials Engineering Inha University)
Cha M. R. (School of Materials Engineering Inha University)
Kim H. S. (School of Materials Engineering Inha University)
Publication Information
Korean Journal of Materials Research / v.14, no.9, 2004 , pp. 670-675 More about this Journal
Abstract
Glasses in the $Bi_{2}O_3-SiO_2-ZnO$ glasses system were examined as a potential replacement for lead-oxide glass frits with low firing temperature ($500\sim600^{\circ}C$) for the dielectric layer of a plasma display panel (PDP). The glasses were evaluated for glass transition temperature($T_{g}$) and thermal expansion coefficient(${\alpha}$). After forming transparent thick films by a screen-printing method, it was evaluated for the optical properties. The transmittance of thick films fired at $500-600^{\circ}C$ showed above $80\%$, which was not dependent on the firing temperature. As a result, many pores were observed at samples fired at low temperature, while the number of pores from samples prepared at high temperature decreased and the pores size increased.
Keywords
transparent dielectric; thick film; optical properties;
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Times Cited By KSCI : 3  (Citation Analysis)
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