Crystallographic and Interfacial Characterization of Al2O3 and ZrO2 Dielectric Films Prepared by Atomic Layer Chemical Vapor Deposition on the Si Substrate
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Kim, Joong-Jung
(Memory R&D Division, Hynix Semiconductor Inc.)
Yang, Jun-Mo (Memory R&D Division, Hynix Semiconductor Inc.) Lim, Kwan-Yong (Memory R&D Division, Hynix Semiconductor Inc.) Cho, Heung-Jae (Memory R&D Division, Hynix Semiconductor Inc.) Kim, Won (Memory R&D Division, Hynix Semiconductor Inc.) Park, Ju-Chul (Memory R&D Division, Hynix Semiconductor Inc.) Lee, Soun-Young (Memory R&D Division, Hynix Semiconductor Inc.) Kim, Jeong-Sun (Technology and Research Center -5 -5, Agency for Defense Development) Kim, Geun-Hong (Technology and Research Center -5 -5, Agency for Defense Development) Park, Dae-Gyu (IBM Microelectronics, Semiconductor R&D Center) |
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