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http://dx.doi.org/10.3740/MRSK.2003.13.7.436

The Characteristics of 〈112〉-preferred Orientation for Photocatalytic TiO2 Fabricated by CVD  

Kang, Kyoung-tae (Department of Materials Science & Engineering, Korea University)
Jhin, Jung-geun (Department of Materials Science & Engineering, Korea University)
Kang, Pil-kyu (Department of Materials Science & Engineering, Korea University)
Ro, Dae-ho (Department of Materials Science & Engineering, Korea University)
Byun, Dong-jin (Department of Materials Science & Engineering, Korea University)
Publication Information
Korean Journal of Materials Research / v.13, no.7, 2003 , pp. 436-441 More about this Journal
Abstract
The characteristics of <112> orientation were studied for the $TiO_2$thin films, which were prepared on the glass by CVD (chemical vapor deposition) at various substrate temperatures. It was confirmed that $TiO_2$ films exhibited <112>-preferred orientation in a specific temperature range. Although $TiO_2$polycrystalline film grown deposited at relatively low temperature showed the growth of random directions, the <112>-preferred orientation was gradually developed with increasing deposition temperature. According to exhibit higher degree of <112>-preferred orientation, $TiO_2$thin film showed porous surface morphology, well-developed columnar structure, and deeper voids resulted from non-aggregation of columns were observed. In addition, transmittance was enhanced. Therefore, the growth of $TiO_2$with <112>-preferred orientation is suitable for glass coating because of predominance of photocatalytic efficiency and transmittance.
Keywords
$TiO_2$; CVD; photocatalytic; preferred orientation;
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  • Reference
1 F. K. Lotgering, J. Inorg. Nucl. Chem., 9, 113 (1959)   DOI   ScienceOn
2 P. Hartman, Crystal Growth, North-Holland, Amsterdam, (1973)
3 N. Tanaka, S. Ohshio and H. Saitoh, J. Ceram. Soc. Jpn., 105, 551 (1997)   DOI
4 A.van der Drift, Philips Res. Rep., 22, 267 (1967)
5 B. Kim, D. Byun, J.-K.Lee and D. Park, Jpn. J. Appl. Phys., 41, 222 (2002)   DOI
6 L. J. Meng and M. P. Dos Santos, Thin Solid Films, 226, 22 (1993)   DOI   ScienceOn
7 B.R. Weibberger, R.B. Garber, Appl. Phys. Lett., 66, 2409 (1995)   DOI   ScienceOn
8 S. Veprek, Thin Solid Films, 130, 135 (1985)   DOI   ScienceOn
9 E. Hecht, Optics, Addison-Wesley, (1987)
10 R. M. Alberici, W. F. Jardim, Appl. Catal. B: Environ., 14, 55 (1997)   DOI   ScienceOn
11 R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A.Kitamura, M. Shimohigoshi and T. Watanabe, Nature, 388, 431 (1997)   DOI   ScienceOn
12 D. Haneman, Surf. Sci., 86, 462 (1979)   DOI   ScienceOn
13 Y. Kikuchi, K. Sumada, T. Iyoda and K. Hashimoto, J. Photochem. Photobiol. A, 106, 51 (1997)   DOI   ScienceOn
14 R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura and M. Shimohigoshi, Adv. Mater., 10, 135 (1998)   DOI   ScienceOn
15 D. Byun, Y. Jin, B. Kim, J. K. Lee and D. Park, J. of Hazardous Materials, 73, 199 (2000)   DOI   ScienceOn
16 Y. Paz, A. Heller, Photooxidatively self-cleaning transparent titanium dioxide films on soda lime glass: The deleterious effect of sodium contamination and its prevention J. Mater. Res., 12, 2759 (1997)   DOI   ScienceOn
17 H. Shibata, M. Murota, K. Hashimoto, Jpn. J. Appl. Phys., 32, 4479 (1993)   DOI