Junction Size Dependence of Magnetic and Magnetotransport Properties in MTJs |
Sankaranarayanan, V.K.
(Department of Materials Science and Engineering Chungnam National University)
Hu, Yong-kang (Department of Materials Science and Engineering Chungnam National University) Kim, Cheol-Gi (Department of Materials Science and Engineering Chungnam National University) Kim, Chong-Oh (Department of Materials Science and Engineering Chungnam National University) Lee, Hee-bok (Department of Pysics Education, Kongju National University) |
1 | T. Miyazaki and N. Tezuka, J. Magn. Magn. Mater., 139, L231 (1995) DOI ScienceOn |
2 | C. G. Kim, T. Shoyama, M. Tsunoda, M. Takahashi, T. Y. Lee and C. O. Kim Korean J.Magnetics, 7, 72 (2002) DOI ScienceOn |
3 | M. Julliere, Phys. Lett., 54A, 225 (1975) |
4 | M. Tsunoda, K. Nishigawa, S. Ogata, M. Takahashi, Appl. Phys. Lett., 80 (2002) 3135 DOI ScienceOn |
5 | J. E. Mahan, Physical vapor deposition of thin films, A Wiley-Interscience Publication, 2000, Ch. VII.5 |
6 | S. S. P. Parkin, K. P. Roche, M. G. Samant, P. M. Rice, R. B. Beyers, R. E. Scheuerlein, E. J. OiSullivan, S. L. Brown, J. Bucchigano, D. W. Abraham, Yu Lu, M. Rooks, P. L. Trouilloud, R. A. Wanner and W. J. Gallagher., J. Appl. Phys., 85, 5828 (1999) DOI ScienceOn |
7 | J. S. Moodera, L. R. Kinder, T. M. Wong and R. Meservey, Phys. Rev. Lett., 74, 3273 (1995) DOI ScienceOn |
8 | J. C. S. Cools, W. Kula, D. Mauri and T. Lin J. Appl. Phys., 85, 4466 (1999) DOI ScienceOn |
9 | J. C. Slonczewski, Phys. Rev., B39, 6995 (1989) DOI ScienceOn |
10 | J. S. Moodera, L. R. Kinder, J. Nowak, P. LeClair and R. Meservey, Appl. Phys. Lett., 69, 708 (1996) DOI ScienceOn |