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http://dx.doi.org/10.3740/MRSK.2003.13.5.303

Effects of Thermal Annealing on the Properties of Amorphous Carbon Nitride Films Deposited by PECVD  

Moon, Hyung-Mo (Dept. of Materials Science and Metallurgical Engineering, Sunchon National University)
Kim, Sang-Sub (Photonic and Electronic Thin Film Laboratory, Dept. of Materials Science and Engineering, Chonnam National University)
Publication Information
Korean Journal of Materials Research / v.13, no.5, 2003 , pp. 303-308 More about this Journal
Abstract
Amorphous carbon nitride films deposited on Si(001) substrates by a plasma enhanced chemical vapor deposition (PECVD) technique using CH$_4$and $N_2$as reaction gases were thermally annealed at various temperatures under$ N_2$atmosphere, then their physical properties were investigated particularly as a function of annealing temperature. Above $600^{\circ}C$ a small amount of crystalline $\beta$-$C_3$$N_4$ phase evolves, while the film surface becomes very rough due to agglomeration of fine grains on the surface. As the annealing temperature increases, both the hardness and the $sp^3$ bonding nature are enhanced. In contrast to our expectation, higher annealing temperature results in a relatively higher friction mainly due to big increase in roughness at that temperature.
Keywords
carbon nitride film; PECVD; amorphous film; thermal annealing; tribology;
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