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http://dx.doi.org/10.4283/JKMS.2010.20.1.008

Magnetostriction and Stress of NiFeCr/(Cu/Co90Fe10)×N/NiFeCr Multilayer Films  

Jo, Soon-Chul (School of Electronic Engineering, Soongsil University)
Abstract
The magnetostriction and stress of multilayer $NiFeCr/(Cu/Co_{90}Fe_{10}){\times}N/NiFeCr$ films were investigated. As the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers was increased, the saturation magnetostriction decreased from $-5.6\times10^{-6}$ at 2 bilayers to $-8.5\times10^{-6}$ at 20 bilayers. A change of CoFe thickness from 10 to $20{\AA}$ caused a decrease in the magnitude of tensile stress from 980MPa to 590MPa as the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers increased from 2 to 20. The maximum magnetostrictive anisotropy field that could be developed due to nonzero magnetostriction and stress is calculated to be 135.7 Oe when the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers is 10.
Keywords
magnetostriction; stress; Cu/CoFe multilayer films; magnetostrictive anisotropy;
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