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http://dx.doi.org/10.4283/JKMS.2008.18.1.028

Relation Between Magnetization Easy Axis and Anisotropic Magnetoresistance in Permalloy Films  

Hwang, Tae-Jong (Department of Physics, Yeungnam University)
Ryu, Yeung-Shik (Department of Physics, Yeungnam University)
Kwon, Jin-Hyuk (Department of Physics, Yeungnam University)
Kim, Ki-Hyeon (Department of Physics, Yeungnam University)
Kim, Dong-Ho (Department of Physics, Yeungnam University)
Abstract
We studied the effect of easy magnetization axis orientation with respect to the strip direction by measuring the magnetoresistance(MR), the magneto-optic Kerr effect(MOKE), and real-time domain evolution. The five strips were patterned on a single chip with the easy axis orientation of each strip relative to the longitudinal direction by around $0^{\circ}$, $18^{\circ}$, $36^{\circ}$, $54^{\circ}$ and $72^{\circ}$, respectively. The overall shape of field dependent MR was mostly governed by the anisotropy magnetoresistnace. The relative change of the longitudinal MR was significantly increased with increasing angle between the easy axis and strip direction, whereas, the transverse MR variation rate was decreased with increasing angle. Several MR steps were observed during the magnetization reversal, and the simultaneous measurement of the MOKE and the domain images identified that the MR steps were associated with evolution of the oppositely directed magnetic domain.
Keywords
anisotropic magnetoresistance; magnetization easy axis; magnetic domain wall; Kerr effect;
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