Browse > Article

FIB Machining Characteristic Analysis according to $Ga^+$ Ion Beam Current  

Kang, Eun-Goo (한국생산기술연구원)
Choi, Byeong-Yeol (한국생산기술연구원 e가공공정팀)
Hong, Won-Pyo (한국생산기술연구원 e가공공정팀)
Lee, Seok-Woo (한국생산기술연구원 e가공공정팀)
Choi, Hon-Zong (한국생산기술연구원 e가공공정팀)
Publication Information
Transactions of the Korean Society of Machine Tool Engineers / v.15, no.6, 2006 , pp. 58-63 More about this Journal
Abstract
FIB equipment can perform sputtering and chemical vapor deposition simultaneously. It is very advantageously used to fabricate a micro structure part having 3D shape because the minimum beam size of ${\Phi}10nm$ and smaller is available. Since general FIB uses very short wavelength and extremely high energy, it can directly make a micro structure less than $1{\mu}m$. As a result, FIB has been probability in manufacturing high performance micro devices and high precision micro structures. Until now, FIB has been commonly used as a very powerful tool in the semiconductor industry. It is mainly used for mask repair, device correction, failure analysis, IC error correction, etc. In this paper FIB-Sputtering and FIB-CVD characteristic analysis were carried out according to $Ga^+$ ion beam current that is very important parameter for minimizing the pattern size and maximizing the yield. Also, for FIB-Sputtering burr caused by redeposition of the substrate characteristic analysis was carried out.
Keywords
FIB-CVD; FIB-Sputtering; Ion Beam Current Characteristic; Burr;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Morita T, Watanabe K, Kometani R, Kanda K, Haruyama Y, Kaito T, Fujita JI, Ishida M, Ochiai Y, Tajima T, Matsui S, 2002, 'Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition,' Jpn. J. Appl. Phys., Vol. 41, pp. 4425-4426
2 Reo, K., Takayuki, H., Kazuhiro, K., Yuichi, H., Takashi, K., Jun-ichi, F., Masahiko, I., Yukinori, O. and Shinji, M., 2005, 'Three-dimensional highperformance nano-tools fabricated using focused-ion-beam chemical-vapor-deposition,' Nuclear Instruments and Methods in Physics Research, B232, pp. 362-366
3 Watanabe, K, Morita, T. and Kometani, R., 2004, 'Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition,' J. Vac. Sci. Technol., B22(1), pp. 22-26
4 Choi, H. Z., Kang, E. G., Lee, S. W. and Hong, W. P., 2004, 'Development of Nano Machining Technology using Focused Ion Beam,' Proceedings of the KSMTE Spring Conference, pp. 482-486
5 Dubner, A. D., 1990, 'Mechanism of Ion Beam Induced Deposition,' Doctoral Thesis, Massachusetts Institute of Technology
6 Greger, T. and Stefan, J., 1998, 'Microprocessing at the fingertips,' J. Micromech. Microeng., Vol. 8, pp.251-262   DOI   ScienceOn
7 Patricia, G. B., 1995, 'High resolution x-ray mask repair,' J. Vac. Sci. Technol., B13(6), Nov/Dec, pp. 3070-3074