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http://dx.doi.org/10.7735/ksmte.2017.26.2.158

Numerical Investigation of Factors affecting Photoresist Stripping Process on the ITO Surface using the Spray Method  

Kim, Joon Hyun (Mechanical and Automotive Engineering, Seoul National University of Science & Technology)
Lee, Joon Hyuck (Mechanical and Automotive Engineering, Seoul National University of Science & Technology)
Kang, Tae Seong (Mechanical and Automotive Engineering, Seoul National University of Science & Technology)
Joo, Gi-Tae (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
Kim, Young Sung (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
Jeong, Byung Hyun (Eotech, GERI)
Lee, Dae Won (DS Techopia)
Publication Information
Journal of the Korean Society of Manufacturing Technology Engineers / v.26, no.2, 2017 , pp. 158-165 More about this Journal
Abstract
This study investigated spraying factors applicable to stripper usage. Cyclodextrine, as environment-friendly material, was included in the stripper composition. An efficient spray technology was applied for the Photoresist strip. For industrial applications, stripping requires a temperature below $50^{\circ}C$, a strip time within 50 s, and chemically stable activation. Spraying factors were organized considering many conditions-orifice diameter, working pressure (inlet speed), spray distance, and spray angle. For commercial practicability, the flow rate was limited to 3 L/min. The nozzle parameters were nozzle orifice diameter of 1.8-2.2 mm, spray distance of 40-60 mm, and injection speed of 0.7-1.2 m/s. Through the thermal spray movement of the fluid, the thermal boundary layer for a chemical reaction just above the ITO-glass surface and momentum region for sufficient agitation (above 4 m/s) was achieved.
Keywords
Agitation; Aqueous stripper; ITO; Photoresist; Spray; Stripping process;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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