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http://dx.doi.org/10.7735/ksmte.2016.25.1.14

Green Photoresist Stripping Process with the Influence of Free Surface from Dip Withdrawal  

Kim, Joon Hyun (Mechanical and Automotive Engineering, Seoul National University of Science & Technology)
Kim, Seung Hyun (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
Jeong, Byung Hyun (Eotech)
Joo, Gi-Tae (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
Kim, Young Sung (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
Publication Information
Journal of the Korean Society of Manufacturing Technology Engineers / v.25, no.1, 2016 , pp. 14-20 More about this Journal
Abstract
This paper describes a green stripping process to effectively strip the remaining DFR layer on a non-alkali-based ITO glass surface after an etching process. A stripper, water-soluble amine compound, is used to investigate the characteristics of stripping ability and to suggest a valid method for the green process. Increasing the composition (5-30% concentration) of the ethanol amine-based stripper was found to greatly reduce the stripping time applied in the dipping method. The composition (30%) achieved an excellent stripping effect and free-residue impurities. Additionally, it was possible to obtain the effect of stripping in a way to sustain the release before generating DFR sludge from the ITO glass surface by using dipping condition (stripping time) in the composition. An Additional stripping process (buffering) out of dipping can realize productivity improvement and cost reduction because of the higher proportion of re-use of the stripping solution used in the DFR removal step.
Keywords
Dip coatings; Formulation; ITO Glass; Photoresist; Stripping process;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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