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http://dx.doi.org/10.9712/KASS.2020.20.4.169

Application of Seismic Base Isolation With Anti-Uplift Device for Arch Structure  

Kim, Gee-Cheol (Dept. of Architecture Eng., Seoil University)
Lee, Joon-Ho (Dept. of Architecture Eng., Seoil University)
Publication Information
Journal of Korean Association for Spatial Structures / v.20, no.4, 2020 , pp. 169-176 More about this Journal
Abstract
When an unexpected excessive seismic load is applied to the base isolation of arch structure, the seismic displacement of the base isolation may be very large beyond the limit displacement of base isolation. These excessive displacement of the base isolation causes a large displacement in the upper structure and large displacement of upper structure causes structural damage. Therefore, in order to limit the seismic displacement response of the base isolation, it is necessary to install an additional device such as an anti-uplift device to the base isolation. In this study, the installation direction of the base isolation and the control performance of the base isolation installed anti-uplift device were investigated. The installation direction of the base isolation of the arch structure is determined by considering the horizontal and vertical reaction forces of the arch structure. In addition, the separation distance of the anti-uplift device is determined in consideration of the design displacement of the base isolation and the displacement of the arch structure.
Keywords
Arch structure; Base isolation; Seismic displacement; Anti-uplift device; Control performance;
Citations & Related Records
Times Cited By KSCI : 4  (Citation Analysis)
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