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http://dx.doi.org/10.13160/ricns.2016.9.4.223

Fabrication of ZnSn Thin Films Obtained by RF co-sputtering  

Lee, Seokhee (Department of Chemistry, Pukyong National University)
Park, Juyun (Department of Chemistry, Pukyong National University)
Kang, Yujin (Department of Chemistry, Pukyong National University)
Choi, Ahrom (Department of Chemistry, Pukyong National University)
Choi, Jinhee (Department of Chemistry, Pukyong National University)
Kang, Yong-Cheol (Department of Chemistry, Pukyong National University)
Publication Information
Journal of Integrative Natural Science / v.9, no.4, 2016 , pp. 223-227 More about this Journal
Abstract
The Zn, Sn, and ZnSn thin films were deposited on Si(100) substrate using radio frequency (RF) magnetron co-sputtering method. A surface profiler and X-ray photoelectron spectroscopy (XPS) were used to investigate the Zn, Sn, and ZnSn thin films. Thickness of the thin films was measured by a surface profiler. The deposition rates of pure Zn and Sn thin films were calculated with thickness and sputtering time for optimization. From the survey XPS spectra, we could conclude that the thin films were successfully deposited on Si(100) substrate. The chemical environment of the Zn and Sn was monitored with high resolution XPS spectra in the binding energy regions of Zn 2p, Sn 3d, O 1s, and C 1s.
Keywords
Zinc Oxide; X-ray Photoelectron Sectroscopy; Thin Films;
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