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Synthesis and Characterization of New Positive Type Photosensitive Poly(amic acid)s  

Sim Hyun-Bo (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Yu Yeong-Im (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Yi Mi-Hye (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Publication Information
Polymer(Korea) / v.30, no.2, 2006 , pp. 162-167 More about this Journal
Abstract
Polyamic acid (PAA) was prepared from cyclobutane-1,2,3,4-tetracarboxylic dianhydride (CBDA) and 4,4'-fiaminodiphenyl ether (DDE). In order to impart a photosensitivity to the PAA, diazonaphthoquinone (DNQ) derivative (DI) was added. However, the addition of the DI was not enough to inhibit the dissolution of the PAA for a aqueous alkal solution. Therefore, we had synthesized poly(amic acid ester)s by an adding 1,2-epoxy-3-phenoxypropane to the PAA. That is, an acidity of the PAA could be controlled by an esterification reaction of 1,2-epoxy-3-phenoxypropane with the PAA. Significant difference of a dissolution rate of the poly(amic acid ester) between an o(posed and unexposed area was observed at an acid content of 60% and less. Resolution of the positively patterned film showed about $25{\mu}m$ at the exposure dose of $200mJ/cm^2$.
Keywords
photosensitive; polyimide; alkali developable; good transmittance; photopatterning;
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