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http://dx.doi.org/10.5757/ASCT.2016.25.2.32

Fabrication of Ultra-smooth 10 nm Silver Films without Wetting Layer

Devaraj, Vasanthan (Department of Physics, Chungnam National University)
Lee, Jongmin (Department of Physics, Chungnam National University)
Baek, Jongseo (Department of Physics, Chungnam National University)
Lee, Donghan (Department of Physics, Chungnam National University)

Publication Information

Applied Science and Convergence Technology / v.25, no.2, 2016 , pp. 32-35 More about this Journal

Abstract

Using conventional deposition techniques, we demonstrate a method to fabricate ultra-smooth 10 nm silver films without using a wetting layer or co-depositing another material. The argon working pressure plays a crucial role in achieving an excellent surface flatness for silver films deposited by DC magnetron sputtering on an InP substrate. The formation of ultra-smooth silver thin films is very sensitive to the argon pressure. At the optimum deposition condition, a uniform silver film with an rms surface roughness of 0.81 nm has been achieved.

Keywords

Silver; Ultra-thin; Surface roughness; Sputtering; Atomic force microscopy; Nanophotonics;

Citations & Related Records

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