Browse > Article
http://dx.doi.org/10.5757/ASCT.2015.24.5.184

Enhancement of Size Gradient of Imprinted Nanopattern by Plasma Etching under a Nonuniform Magnetic Field  

Lim, Jonghwan (Department of Chemistry, Sungkyunkwan University (SKKU))
Kim, Soohyun (Department of Chemistry, Sungkyunkwan University (SKKU))
Kim, Da Sol (Department of Chemistry, Sungkyunkwan University (SKKU))
Jeong, Mira (Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery & Materials (KIMM))
Lee, Jae-Jong (Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery & Materials (KIMM))
Yun, Wan Soo (Department of Chemistry, Sungkyunkwan University (SKKU))
Publication Information
Applied Science and Convergence Technology / v.24, no.5, 2015 , pp. 184-189 More about this Journal
Abstract
We report a simple way to enhance the size gradient of an imprinted nanopattern through oxygen plasma etching under a nonuniform magnetic field. A sample substrate was placed next to a magnet, and then a nonuniform magnetic field condition was formed around the sample. Using oxygen plasma etching, a line pattern having an initial width of 273 nm was gradually modified from 248 nm at one end to 182 nm at the other end. Controlling the arrangement of the magnet and sample, we could induce a triangular shape size gradient. We verified that the gradually modified nanopatterns we produced are applicable to continual optical property control, showing a possibility to be utilized for optical components such as gratings and polarizers.
Keywords
Imprint; Nanopattern; Magnetic field; Oxygen plasma; Etching;
Citations & Related Records
연도 인용수 순위
  • Reference
1 S.-W. Ahn, K.-D. Lee, J.-S Kim, S. H. Kim, J.-D. P, S.-H. Lee, and P.-W. Yoon, Nanotechnology 16, 1874 (2005).   DOI   ScienceOn
2 C. Trompoukis, O. E. Daif, V. Depauw, I. Gordon, and J. Poortmans, Appl. Phys. Lett. 101, 103901 (2012).   DOI   ScienceOn
3 Y. J. Shin, C. Pina-Hernandez, Y.-K. Wu, J. G. Ok, and L. J. Guo, Nanotechnology 23, 344018 (2012).   DOI   ScienceOn
4 J. L. Skinner, L. L. Hunter, A. A. Talin, J. Provine, and D. A. Horsley, IEEE Trans. Nanotechnol. 7, 527 (2008).   DOI   ScienceOn
5 M.-G. Kang, H. J. Park, S. H. Ahn, L. J. Guo, Sol. Energy Mater. Sol. Cells 94, 1179 (2010).   DOI   ScienceOn
6 Z. Chen, B. Cotterell, W. Wang, E. Guenther, S.-J. Chua, Thin Solid Films 394, 202 (2001).
7 J. O. Ok, M. K. Kwak, C. M. Huard, H. S. Youn, and L. J. Guo, Adv. Mater. 25, 6554 (2013).   DOI   ScienceOn
8 M. E. Garah, N. Marets, M. Mauro, A. Aliprandi, S. Bonacchi, L. D. Cola, A. Ciesielski, V. Bulach, M. W. Hosseini, and P. Samori, J. An. Che. Soc., 137, 8450 (2015).   DOI   ScienceOn
9 M. K. Kwak, J. G. Ok, J. Y. Lee, and L. J. Guo, Nanotechnology 23, 344008 (2012).   DOI   ScienceOn
10 W. A. Luhman, and R. J. Holmes, Adv. Funct. Mater. 21, 764 (2011).   DOI   ScienceOn
11 T. Xu, Y.-K. Wu, X. Luo, and L. J. Guo, Nat. Commun. 59, 1 (2010).
12 C. Battaglia, J. Escarre, K. Soderstrom, L. Erni, L. Ding, G. Bugnon, A. Billet, M. Boccard, L. Barraud, S. D. Wolf, F.-J. Haug, M. Despeisse, and C. Ballif, Nano Lett. 11, 661 (2011).   DOI   ScienceOn
13 K.-T. Lee, J.-H. Park, S. J. Kwon, H.-K. Kwon, J. Kyhm, K.-W. Kwak, H. S. Jang, S. Y. Kim, J. S. Han, S.-H. Lee, D.-H. Shin, H. Ko, I.-K. Han, B.-K. Ju, S.-H. Kwon, and D.-H. Ko, Nano Lett. 15, 2491-2497 (2015).   DOI   ScienceOn
14 D. Kim, S.-B. Jeon, J. Y. Kim, M.-L. Seol, S. O. Kim, Y.-K. Choi, Nano Energy, 12, 331 (2015).   DOI   ScienceOn
15 S.-W. Lee, K.-S. Lee, J. Ahn, J.-J Lee, M.-G. Kim, and Y.-B. Shin, ACS Nano 5, 897 (2011).   DOI   ScienceOn
16 A. Cattoni, P. Ghenuche, A.-M Haghiri-Gosnet, D. Decanini, J. Chen, J.-L Pelouard, and S. Collin, Nano Lett. 11, 3557 (2011).   DOI   ScienceOn
17 C. Pina-Hernandez, P.-F. Fu, and L. J. Guo, ACS Nano 5, 923 (2011).   DOI   ScienceOn
18 F. Fernandez, O. G. Lopez, E. Tellechea, A. C. Asensio, J. F. Moran, and I. Cornago, IEEE Trans. Nanotechnol. 13, 308 (2014).   DOI   ScienceOn
19 J. Lee, S. Cho, J. Lee, H. Ryu, J. Park, S. Lim, b. Oh, C. Lee, W. Huang, A. Busnaina, H. Lee, J. Biotechnol., 168, 584-588 (2013).   DOI   ScienceOn
20 C.-W. Kuo, J.-Y. Shiu, and P. Chen, Chem. Mater. 15, 2917 (2003).   DOI   ScienceOn
21 D. K. Park, A. Kang, M. Jeong, J.-J Lee, and W. S. Yun, Thin Solid Films 567, 54 (2014).   DOI   ScienceOn
22 Y. Ding, H. J. Qi, K. J. Alvine, H. W. Ro, D. U. Ahn, S. Lin-Gibson, J. F. Douglas, and C. L. Soles, Macromolecules 43, 8191 (2010).   DOI   ScienceOn
23 P. Falstad, Electrodynamics Simulation (TM), www.falstad.com/mathphysics.html (27 July 2015).