Browse > Article
http://dx.doi.org/10.4313/TEEM.2017.18.2.93

Characteristics of Ti Thin films and Application as a Working Electrode in TCO-Less Dye-Sensitized Solar Cells  

Joo, Yong Hwan (Department of Electrical Engineering, Chosun University)
Kim, Nam-Hoon (Department of Electrical Engineering, Chosun University)
Park, Yong Seob (Department of Electronics, Chosun College of Science and Technology)
Publication Information
Transactions on Electrical and Electronic Materials / v.18, no.2, 2017 , pp. 93-96 More about this Journal
Abstract
The structural, electrical and optical properties of Ti thin films fabricated by dual magnetron sputtering were investigated under various film thicknesses. The fabricated Ti thin films exhibited uniform surfaces, crystallinity, various grain sizes, and with various film thicknesses. Also, the crystallinity and grain size of the Ti thin films increased with the increase of film thickness. The electrical properties of Ti thin films improved with the increase of film thickness. The results showed that the performance of TCO-less DSSC critically depended on the film thickness of the Ti working electrodes, due to the conductivity of Ti thin film. However, the maximum conversion efficiency of TCO-less DSSC was exhibited at the condition of 100 nm thickness due to the surface scattering of photons caused by the variation of grain size.
Keywords
Ti thin film; Magnetron sputtering; Dye-sensitized solar cell; Resistivity;
Citations & Related Records
연도 인용수 순위
  • Reference
1 S. Suhaimi , M. M. Shahimin, Z. A. Alahmed, J. Chyský, and A. H. Reshak, Int. J. Electrochem. Sci., 10, 2859 (2015).
2 Z. Chen, W. Li, R. Li, Y. Zhang, G. Xu, and H. Cheng, Langmuir, 29, 13836 (2013). [DOI: https://doi.org/10.1021/la4033282]   DOI
3 H.-G. Yun, M. Kim, M. G. Kang, and I.-H. Lee, Phys. Chem. Chem. Phys., 14, 6448 (2012). [DOI: https://doi.org/10.1039/c2cp40205j]   DOI
4 N. Muslim, Y. W. Soon, C. M. Lim, and N. Y. Voo, ARPN J. Eng. Appl.Sci., 10, 7184 (2015).
5 K. Buijs, Stainless Steel World, 17, 1 (2005).
6 Y. M. Lu, W. S. Hwang, W. Y. Liu, and J. S. Yang , Mater. Chem. Phys., 72, 269. (2001). [DOI: https://doi.org/10.1016/S0254-0584(01)00450-3]   DOI
7 Y. L. Jeyachandran, B. Karunagaran, S. K. Narayandass, and D. Mangalaraj, Mat. Sci. Eng. A-Struct., 458, 361 (2007). [DOI: https://doi.org/10.1016/j.msea.2006.12.088]   DOI
8 K. Hofmann, B. Spangenberg, M. Luysberg, and H. Kurz, Thin Solid Films, 436, 168 (2003). [DOI: https://doi.org/10.1016/S0040-6090(03)00582-0]   DOI
9 S. Schiller, G. Beister, W. Sieber, G. Schirmer, and E. Hacker, Thin Solid Films, 83, 239 (1981). [DOI: https://doi.org/10.1016/0040-6090(81)90673-8]   DOI
10 S. Yun, P. D. Lund, and A. Hinsch, Energy Environ. Sci., 8, 3495 (2015). [DOI: https://doi.org/10.1039/C5EE02446C]   DOI
11 G. Kang, J. Choi, and T. Park, Sci. Rep., 6, 22987 (2016). [DOI: https://doi.org/10.1038/srep22987]   DOI
12 A. Grill, Surf. Coat. Technol., 94, 507 (1997). [DOI: https://doi.org/10.1016/S0257-8972(97)00458-1]
13 A. Czyzniewski, Thin Solid Films, 433, 180 (2003). [DOI: https://doi.org/10.1016/S0040-6090(03)00324-9]   DOI
14 L. J. Meng and M. P. dos Santos, Thin Solid Films, 226, 22 (1993). [DOI: https://doi.org/10.1016/0040-6090(93)90200-9]   DOI
15 L. Han, N. Koide, Y. Chiba, A. Islam, R. Komiya, N. Fuke, A. Fukui, and R. Yamanaka, Appl. Phys. Lett., 86, 213501 (2005). [DOI: https://doi.org/10.1063/1.1925773]   DOI
16 L. Han, N. Koide, Y. Chiba, and T. Mitate, Appl. Phys. Lett., 84, 2433 (2004).   DOI
17 M. Adachi, M. Sakamoto, J. Jiu, Y. Ogata, and S. Isoda, J. Phys. Chem. B, 110, 13872 (2006).   DOI