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http://dx.doi.org/10.4313/TEEM.2017.18.1.13

Low Emissivity Property of Amorphous Oxide Multilayer (SIZO/Ag/SIZO) Structure  

Lee, Sang Yeol (Department of Semiconductor Engineering, Cheongju University)
Publication Information
Transactions on Electrical and Electronic Materials / v.18, no.1, 2017 , pp. 13-15 More about this Journal
Abstract
Low emissivity glass for high transparency in the visible range and low emissivity in the IR (infrared) range was fabricated and investigated. The multilayers were have been fabricated, and consisted of two outer oxide layers and a middle layer of Ag as a metal layer. Oxide layers were formed by rf sputtering and metal layers were formed using by an evaporator at room temperature. SiInZnO (SIZO) film was used as an oxide layer. The OMO (oxide-metaloxide) structures of SIZO/Ag/SIZO were analyzed by using transmittance, AFM (atomic force microscopye), and XRD (X-ray diffraction). The OMO multilayer structure was designed to investigate the effect of Ag layer thickness on the optical property of the OMO structure.
Keywords
a-SiInZnO; Oxide-metal-oxide multilayer; Ag; Transparent film; Oxide based semiconductor;
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