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http://dx.doi.org/10.4313/TEEM.2012.13.1.27

H2S Micro Gas Sensor Based on a SnO2-CuO Multi-layer Thin Film  

Kim, Sung-Eun (MEMS/NANO Fabrication Center)
Choi, Woo-Chang (MEMS/NANO Fabrication Center)
Publication Information
Transactions on Electrical and Electronic Materials / v.13, no.1, 2012 , pp. 27-30 More about this Journal
Abstract
This paper proposes a micro gas sensor for measuring $H_2S$ gas. This is based on a $SnO_2$-CuO multi-layer thin film. The sensor has a silicon diaphragm, micro heater, and sensing layers. The micro heater is embedded in the sensing layer in order to increase the temperature to an operating temperature. The $SnO_2$-CuO multi layer film is prepared by the alternating deposition method and thermal oxidation which uses an electron beam evaporator and a thermal furnace. To determine the effect of the number of layers, five sets of films are prepared, each with different number of layers. The sensitivities are measured by applying $H_2S$ gas. It has a concentration of 1 ppm at an operating temperature of $270^{\circ}C$. At the same total thickness, the sensitivity of the sensor with multi sensing layers was improved, compared to the sensor with one sensing layer. The sensitivity of the sensor with five layers to 1 ppm of $H_2S$ gas is approximately 68%. This is approximately 12% more than that of a sensor with one-layer.
Keywords
$H_2S$; Gas sensor; $SnO_2$-CuO; Multi-layer; MEMS;
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1 R. B. Vasiliev, M. N. Rumyantseva, N. Y. Yakovlev, and A. M. Gasckov, Sensor. Actuat. B 50, 186 (1998) [DOI: 10.1016/S0925- 4005(98)00235-4].   DOI   ScienceOn
2 T. Maekawa, J. Tamaki, N. Miura, and N. Yamazoe, J. Mater. Chem. 4, 1259 (1994) [DOI: 10.1039/JM9940401259].   DOI
3 J. Tamaki, T. Maekawa, N. Miura, and N. Yamazoe, Sensor. Actuat. B 9, 197 (1992) [DOI: 10.1016/0925-4005(92)80216-K].   DOI   ScienceOn
4 T. Mochida, K. Kikuchi, T. Kondo, H. Ueno, and Y. Matsuura, Sensor. Actuat. B 24, 433 (1995) [DOI: 10.1016/0925- 4005(95)85098-8].   DOI   ScienceOn
5 D. H. Dawson, G. S. Henshaw, and D. E. Williams, Sensor. Actuat. B 26, 76 (1995) [DOI: 10.1016/0925-4005(94)01560-5].   DOI   ScienceOn
6 Y. Zhu, J. Shi, Z. Zhang, C. Zhang, and X. Zhang, Anal. Chem. 74, 120 (2002) [DOI: 10.1021/ac010450p].   DOI   ScienceOn
7 A. Khanna, R. Kumar, and S. S. Bhatti, Appl. Phys. Lett. 82, 4388 (2003) [DOI: 10.1063/1.1584071].   DOI   ScienceOn
8 T. Kwon, S. Park, J. Ryu, and H. Choi, Sensor. Actuat. B 46, 75 (1998) [DOI: 10.1016/S0925-4005(97)00324-9].   DOI   ScienceOn
9 T. Gessner, K. Gottfried, R. Hoffmann, C. Kaufmann, and U. Weiss, Microsyst. Technol. 6, 169 (2000) [DOI: 10.1007/ s005420000048]   DOI
10 G. Faglia, E. Comini, M. Pardo, A. Taroni, G. Cardinali, S. Nicoletti, and G. Sberveglieri, Microsyst. Technol. 6, 54 (1999) [DOI: 10.1007/s005420050175].   DOI
11 N. Yamazoe, Y. Kurokawa, and T. Seiyama, Sensor. Actuat. B 4, 283 (1983) [DOI: 10.1016/0250-6874(83)85034-3].   DOI   ScienceOn
12 S. M. Sze, Semiconductor Sensors (Wiley, New York, 1995) p. 383.
13 S. Plazer, E. Moretton, F. H. Ramirez, A. Romano-Rodriguez, and J. Wollenstein, Microsyst. Technol. 14, 645 (2008) [DOI: 10.1007/s00542-007-0473-3].   DOI
14 J. Watson, Sensor. Actuat. B 5, 29 (1984) [DOI: 10.1016/0250- 6874(84)87004-3].   DOI   ScienceOn
15 M. S. Wagh, L. A. Patil, T. Seth, and D. P. Amalnerkar, Mater. Chem. Phys. 84, 228 (2004) [DOI: 10.1016/S0254- 0584(03)00232-3].   DOI   ScienceOn
16 S. R. Morrison, Sensor. Actuat. B 12, 425 (1987) [DOI: 10.1016/0250-6874(87)80061-6].   DOI   ScienceOn
17 V. R. Katti, A. K. Debnath, K. P. Muthe, M. Kaur, A. K. Dua, S. C. Gadkari, S. K. Gupta, and V. C. Sahni, Sensor. Actuat. B 96, 245 (2003) [DOI: 10.1016/S0925-4005(03)00532-X].   DOI   ScienceOn
18 J. Tamaki, K. Shimanoe, Y. Yamada, Y. Yamamoto, N. Miura, and N. Yamazoe, Sensor. Actuat. B 49, 121 (1998) [DOI: 10.1016/ S0925-4005(98)00144-0].   DOI   ScienceOn
19 W. Yuanda, T. Maosong, H. Xiuli, Z. Yushu, and D. Guorui, Sensor. Actuat. B 79, 187 (2001) [DOI: 10.1016/S0925- 4005(01)00873-5].   DOI   ScienceOn
20 R. S. Niranjan, K. P. Patil, S. R. Sainkar, and I. S. Mulla, Mater. Chem. Phys. 80, 250 (2003) [DOI: 10.1016/S0254- 0584(02)00467-4].   DOI   ScienceOn