Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma |
Heo, Sung-Bo
(School of Materials Science and Engineering, University of Ulsan)
Lee, Hak-Min (School of Materials Science and Engineering, University of Ulsan) Kim, Dae-Il (School of Materials Science and Engineering, University of Ulsan) Choi, Dae-Han (Shinki Intermobile) Lee, Byung-Hoon (Shinki Intermobile) Kim, Min-Gyu (Shinki Intermobile) Lee, Jin-Hee (Autotech Korea) |
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