Browse > Article
http://dx.doi.org/10.4313/TEEM.2008.9.4.163

A Study on the Dip-pen Nanolithography Process and Fabrication of Optical Waveguide for the Application of Biosensor  

Kim, Jun-Hyong (Interdisciplinary Program of Photonic Engineering, Chonnam Natioanl University)
Yang, Hoe-Young (Interdisciplinary Program of Photonic Engineering, Chonnam Natioanl University)
Yu, Chong-Hee (Optical Communications Research Center, Electronics and Telecommunications Research Institute)
Lee, Hyun-Yong (Center for Functional Nano Fine Chemicals, Faculty of Applied Chemical Engineering, Chonnam National University)
Publication Information
Transactions on Electrical and Electronic Materials / v.9, no.4, 2008 , pp. 163-168 More about this Journal
Abstract
Photonic crystal structures have been received considerable attention due to their high optical sensitivity. One of the techniques to construct their structure is the dip-pen lithography (DPN) process, which requires a nano-scale resolution and high reliability. In this paper, we propose a two dimensional photonic crystal array to improve the sensitivity of optical biosensor and DPN process to realize it. As a result of DPN patterning test, we have observed that the diffusion coefficient of the mercaptohexadecanoic acid (MHA) molecule ink in octanol is much larger than that in acetonitrile. In addition, we have designed and fabricated optical waveguides based on the mach-zehnder interferometer (MZI) for application to biosensors. The waveguides were optimized at a wavelength of 1550 nm and fabricated according to the design rule of 0.45 delta%, which is the difference of refractive index between the core and clad. The MZI optical waveguides were measured of the optical characteristics for the application of biosensor.
Keywords
Dip-pen nanolithography; Mach-zehnder interferometer; Photonic crystal; Optical biosensor;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 P. J. Silverman, "The interl lithography roadmap", Intel Technol. J., Vol. 6, No. 2, p. 55, 2002
2 J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, "Ultrahigh resolution of calixarene negative resist in electron beam lithography", Appl. Phys. Lett., Vol. 68, No. 9, p. 1297, 1996   DOI
3 F. Prieto, B. Sepulveda, A. Calle, A. Llobera, C. Dominguez, and L. M. Lechuga, "Integrated Mach- Zehnder interferometer based on ARROW structures for biosensor applications", Sens. Actuators, B 92, p. 151, 2003
4 A. K. Sheridan, R. D. Harris, P. N. Bartlett, and J. S. Wilkinson, "Phase interrogation of an integrated optical SPR sensor", Sens. Actuators, B 97, p. 114, 2004
5 S. B. Clendenning, S. Aouba, M. S. Rayat, D. Grozea, J. B. Sorge, P. M. Brodersen, R. N. S. Sodhi, Z. H. Lu, C. M. Yip, M. R. Freeman, H. E. Ruda, and I. Manners, "Direct writing of patterned ceramics using electron-beam lithography and metallopolymer resists", Adv. Mater., Vol. 16, No. 3, p. 215, 2004   DOI   ScienceOn
6 J. D. Joannopoulos, R. D. Meade, and J. Winn, "Photonic Crystals", Princeton Univ. Press, Princeton, 1995
7 W. Chu, H. I. Smith, and M. L. Schattenburg, "Replication of 50 nm linewidth device patterns using proximity x-ray lithography at large gaps", Appl. Phys. Lett., Vol. 59, No. 13, p. 1641, 1991   DOI
8 E. Yablonovitch, "Photonic crystals", J. Mod. Opt., Vol. 41, No. 2, p. 173, 1994   DOI   ScienceOn
9 E. Yablonovitch, "Photonic band-gap structures", J. Opt. Soc. Am., B 10, No. 2, p. 283, 1993
10 R. Levy, A. Peled, and S. Ruschin, "Waveguided SPR sensor using a Mach-Zehnder interferometer with variable ratio", Sens. Actuators, B 119, p. 20 2006
11 R. D. Piner, S. Hong, and C. A. Mirkin, "Improved imaging of soft materials with modified AFM tips", Langmuir, Vol. 15, No. 17, p. 5457, 1999   DOI   ScienceOn
12 S. H. Hong, J. Zhu, and C. A. Mirkin, "Dip-pen nanolithography", Science, Vol. 286, p. 523, 1999   DOI   ScienceOn
13 D. A. Weinberger, S. G. Hong, B. W. Wessels, and T. B. Higgins, "Combinatorial generation and analysis of nanometer- and micrometer-scale silicon features via 'Dip-pen' nanolithography and wet chemical etching", Adv. Mater., Vol. 12, No. 21, p. 1600, 2000   DOI   ScienceOn
14 R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, "Dip-pen nanolithography", Science, Vol. 283, p. 661, 1999   DOI   ScienceOn
15 S. Hong, J. Jhu, and C. A. Mirkin, "A new tool for studying the in situ growth processes for selfassembled monolayers under ambient conditions", Langmuir, Vol. 15, No. 23, p. 7897, 1999   DOI   ScienceOn
16 J. Homola, S. S. Yee, D. Myszka, in: F. S. Ligler, C. A. Rowe Taitt (Eds.), "Optical Biosensors", Elsevier, Amsterdam, p. 207, 2002
17 E. F. Schipper, A. M. Brugman, C. Domingues, L. M. Lechuga, R. P. H. Kooyman, and J. Greve, "The realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology", Sens. Actuators, B 40, p. 147, 1997
18 J. M. Gibson, "Reading and writing with electron beams", Phys. Today, Vol. 50, No. 10, p. 56, 1997
19 B. W. Maynor, Y. Li, and J. Liu, "Au 'Ink' for AFM 'Dip-pen' nanolithography", Langmuir, Vol. 17, No. 9, p. 2575, 2001   DOI   ScienceOn
20 H. S. Kim, D. H. Shin, S. K. Kim, J. K. Rhee, B. S. Lee, H. W. Kim, J. U. Lee, Y. S. Han, and Y. H. Choe, "Fabrication technology for improving pattern quality in two-dimensional photonic crystal structure", J. of KIEEME(in Korean), Vol. 16, No. 6, p. 515, 2003   과학기술학회마을   DOI   ScienceOn
21 J. Haaheim, R. Eby, M. Nelson, J. Fragala, B. Rosner, H. Zhang, and G. Athas, "Dip-pen nanolithography (DPN): process and instrument performance with Nanoink's NSCRIPTOR system", Ultramicroscopy, Vol. 103, No. 2, p. 117, 2005   DOI   ScienceOn
22 J. G. Goodberlet, "Patterning 100 nm features using deep-ultraviolet contact photolithography", Appl. Phys. Lett., Vol. 76, No. 6, p. 667, 2000   DOI   ScienceOn