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http://dx.doi.org/10.4313/TEEM.2003.4.3.015

Al2O3 Nano-Coating by Atomic Layer Deposition  

Min Byung-Don (Department of Electrical Engineering, Korea University)
Lee Jong-Soo (Department of Electrical Engineering, Korea University)
Kim Sang-Sig (Department of Electrical Engineering, Korea University)
Publication Information
Transactions on Electrical and Electronic Materials / v.4, no.3, 2003 , pp. 15-18 More about this Journal
Abstract
Aluminum oxide ($Al_2O_3$) materials were coated conformally on ZnO nanorods by atomic layer deposition (ALD). The ZnO nanorods were first synthesized on a Si(100) substrate from ball-milled ZnO powders by a thermal evaporation procedure. $Al_2O_3$ films were then deposited on these ZnO nanorods by ALD at a substrate temperature of $300^{\circ}C$ using trimethylaluminum (TMA) and distilled water ($H_2O$). Transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM) images of the deposited ZnO nanorods revealed that amorphous $Al_2O_3$ cylindrical shells surround the ZnO nanorods. These TEM images illustrate that ALD has an excellent capability to coat any shape of nanorods conformally.
Keywords
ZnO nanorod; Atomic layer deposition; Coating; TEM;
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