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http://dx.doi.org/10.4313/TEEM.2002.3.4.027

Fabrication of Novel Thin Film Diode with Multi-step Anodic Oxidation and Post Heat-treatment  

Hong, Sung-Jei (Information Display Research Center, Korea Electronics Technology Institute)
Lee, Chan-Jae (Information Display Research Center, Korea Electronics Technology Institute)
Moon, Dae-Gyu (Information Display Research Center, Korea Electronics Technology Institute)
Kim, Won-Keun (Information Display Research Center, Korea Electronics Technology Institute)
Han, Jeong-In (Information Display Research Center, Korea Electronics Technology Institute)
Publication Information
Transactions on Electrical and Electronic Materials / v.3, no.4, 2002 , pp. 27-31 More about this Journal
Abstract
Thin film diode with reliable interfacial structure was fabricated by using multi-step anodic oxidation. The thickness of the oxide layer was preciously controlled with anodic voltage. Also, interfacial structure between oxide layer and top electrode was improved by applying post heat-treatment. The thin film diode showed symmetric and stable I-V characteristics after the post heat-treatment.
Keywords
Thin-film diode; Multi-step; Anodic oxidation; Top electrode; Heat-treatment;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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