Surface Treatment of Ge Grown Epitaxially on Si by Ex-Situ Annealing for Optical Computing by Ge Technology |
Chen, Xiaochi
(Department of Electrical Engineering, Stanford University)
Huo, Yijie (Department of Electrical Engineering, Stanford University) Cho, Seongjae (Department of Electronic Engineering, Gachon University) Park, Byung-Gook (Department of Electrical and Computer Engineering with Inter-university Semiconductor Research Center (ISRC), Seoul National University) Harris, James S. Jr. (Department of Electrical Engineering, Stanford University) |
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