[KSCI] Korea Science Citation Index Service

http://dx.doi.org/10.5573/JSTS.2011.11.4.302

Optical Failure Analysis Technique in Deep Submicron CMOS Integrated Circuits

Kim, Sunk-Won (Dep. EE., Seoul National University)
Lee, Hyong-Min (Dep. EE., Seoul National University)
Lee, Hyun-Joong (Dep. EE., Seoul National University)
Woo, Jong-Kwan (Dep. EE., Seoul National University)
Cheon, Jun-Ho (Dep. EE., Seoul National University)
Kim, Hwan-Yong (Dep. EE., Wonkwang University)
Park, Young-June (Dep. EE., Seoul National University)
Kim, Su-Hwan (Dep. EE., Seoul National University)

Publication Information

JSTS:Journal of Semiconductor Technology and Science / v.11, no.4, 2011 , pp. 302-308 More about this Journal

Abstract

In this paper, we have proposed a new approach for optical failure analysis which employs a CMOS photon-emitting circuitry, consisting of a flip-flop based on a sense amplifier and a photon-emitting device. This method can be used even with deep-submicron processes where conventional optical failure analyses are difficult to use due to the low sensitivity in the near infrared (NIR) region of the spectrum. The effectiveness of our approach has been proved by the failure analysis of a prototype designed and fabricated in 0.18 ${\mu}m$ CMOS process.

Keywords

Circuit testing; deep submicron CMOS technology; failure analysis; photon emission; picosecond imaging circuit analysis (PICA);

Citations & Related Records

Times Cited By SCOPUS : 0

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