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http://dx.doi.org/10.1016/j.cap.2018.10.005

The characteristic of Cu2ZnSnS4 thin film solar cells prepared by sputtering CuSn and CuZn alloy targets  

Lu, Yilei (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Wang, Shurong (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Ma, Xun (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Xu, Xin (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Yang, Shuai (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Li, Yaobin (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Tang, Zhen (Key Laboratory of Rural Energy Engineering in Yunnan Province, Yunnan Normal University)
Publication Information
Current Applied Physics / v.18, no.12, 2018 , pp. 1571-1576 More about this Journal
Abstract
Recent study shows that the main reason for limiting CZTS device performance lies in the low open circuit voltage, and crucial factor that could affect the $V_{oc}$ is secondary phases like ZnS existing in absorber layer and its interfaces. In this work, the $Cu_2ZnSnS_4$ thin film solar cells were prepared by sputtering CuSn and CuZn alloy targets. Through tuning the Zn/Sn ratios of the CZTS thin films, the crystal structure, morphology, chemical composition and phase purity of CZTS thin films were characterized by X-Ray Diffraction (XRD), scanning electron microscopy (SEM) equipped with an energy dispersive spectrometer (EDS) and Raman spectroscopy. The statistics data show that the CZTS solar cell with a ratio of Zn/Sn = 1.2 have the best power convention efficiency of 5.07%. After HCl etching process, the CZTS thin film solar cell with the highest efficiency 5.41% was obtained, which demonstrated that CZTS film solar cells with high efficiency could be developed by sputtering CuSn and CuZn alloy targets.
Keywords
CZTS thin film; Alloy targets; Solar cell; HCl etching;
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