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The Effect of Heat Treatment on the Morphological and Electrical Properties of Aluminum-Doped Zinc-Oxide Films  

Lim, D.G. (Department of Electronic Engineering/Research Center for Sustainable ECo-Devices and Materials, Chungju National University)
Kang, G.S. (Department of Electronic Engineering/Research Center for Sustainable ECo-Devices and Materials, Chungju National University)
Kwon, S.I. (Department of Electronic Engineering/Research Center for Sustainable ECo-Devices and Materials, Chungju National University)
Yi, J.H. (Department of Electronic Engineering/Research Center for Sustainable ECo-Devices and Materials, Chungju National University)
Park, M.W. (Department of Advanced Materials Engineering, Kyungsung University)
Kwak, D.J. (Department of Electrical Engineering, Kyungsung University)
Publication Information
Journal of the Korean Physical Society / v.51, no.3, 2007 , pp. 1073-1075 More about this Journal
Abstract
In this paper, we report an investigation into the effect of heat treatment on the morphological and electrical properties of aluminum-doped zinc-oxide (ZnO:Al) films. ZnO:Al films were deposited on glass substrates by DC magnetron sputtering from a ZnO target mixed with 2 wt\% Al$_2$O$_3$. We carried out heat treatments in argon and oxygen atmospheres at 100 $\sim$ 400 $^\circ$C for 60 min. As the annealing temperature was increased, the film showed a looser structure, smaller grain size, and rougher surface. On increasing the annealing temperature, the film resistivity was increased due to a decrease in the carrier concentration. The electrical resistivity increased by 34 \% with increasing annealing temperature up to 400 $^\circ$C.
Keywords
ZnO:Al film; DC magnetron sputtering; Heat treatment;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
Times Cited By Web Of Science : 1  (Related Records In Web of Science)
Times Cited By SCOPUS : 2
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