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http://dx.doi.org/10.3807/JOSK.2012.16.3.228

Wavefront Sensitivity Analysis Using Global Wavefront Aberration in an Unobscured Optical System  

Joo, Won Don (Samsung Electronics)
Publication Information
Journal of the Optical Society of Korea / v.16, no.3, 2012 , pp. 228-235 More about this Journal
Abstract
It is very important to analyze effectively the tolerance of an optical system with high resolution as the projection lens of photolithography or as the objective lens of a microscope. We would like to find an effective assembly structure and compensators to correct aberrations through global wavefront sensitivity analysis using Zernike polynomial expansion from the field and pupil coordinates rather than from only pupil coordinates. In this paper, we introduce global wavefront coefficients by small perturbations of the optical system, and analyze the optical performance with these coefficients. From this analysis, it is possible to see how we can enlarge the tolerance through the proper assembly structure and compensators.
Keywords
Global wavefront deformation; Tolerance analysis; Compensator; Assembly structure; Distortion;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
Times Cited By Web Of Science : 0  (Related Records In Web of Science)
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