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http://dx.doi.org/10.3807/JOSK.2003.7.3.160

Micromachining of Cr Thin Film and Glass Using an Ultrashort Pulsed Laser  

Choi, Ji-Yeon (Nano process group, Korea Institute of Machinery and Materials)
Kim, Jae-Gu (Nano process group, Korea Institute of Machinery and Materials)
Shin, Bo-Sung (Nano process group, Korea Institute of Machinery and Materials)
Whang, Kyung-Hyun (Nano process group, Korea Institute of Machinery and Materials)
Publication Information
Journal of the Optical Society of Korea / v.7, no.3, 2003 , pp. 160-164 More about this Journal
Abstract
Materials processing by ultrashort pulsed laser is actively being applied to micromachining technology due to its advantages with regard to non-thermal machining. In this study, materials processing with ultrashort pulses was studied by using the high repetition rate of a 800 nm Ti:sapphire regenerative amplifier. This revealed that the highly precise micromachining of metallic thin film and bulk glass with a minimal heat affected zone (HAZ) could be obtained by using near damage threshold energy. Grooves with diffraction limited sub-micrometer width were obtained with widths of 620 nm on Cr thin film and 800 nm on a soda-lime glass substrate. The machined patterns were investigated through SEM images. We also phenomenologically examined the influence of variations of parameters and proposed the optimal process conditions for microfabrication.
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