1 |
M. D. Levenson, et al., ED-29, 12 1928 (1982).
|
2 |
W. Maurer, C. Dolainsky, J. Thiele, C. Friedrich, and P. Karakatsanis, Proc. of SPIE Optical Microlithography XI, 3334, 245 (1998).
DOI
|
3 |
E. Kawamura, T. Haruki, Y. Manabe, and I. Hanyu, Jpn. J. Appl. Phys. 34, 6547 (1995).
DOI
|
4 |
B. H. Nam, J. O. Park, D. J. Lee, J. H. Cheong, Y. J. Hwang, and Y. J. Song, Proceedings of SPIE, Photomask and Next-Generation Lithography Mask Technology VII, 4066, 716 (2000).
DOI
|
5 |
A. Misaka, A. Goda, S. Odanaka, S. Kobayashi, and H. Watanabe, VLSI Symposium '98, 170 (1998).
DOI
|
6 |
K. Hashimoto, S. Usui, S. Hasebe, M. Murota, T. Nakayama, F. Matsuoka, S. Inoue, S. Kobayashi, and K. Yamamoto, Proc. of SPIE Optical Microlithography XI 3334, 224 (1998).
DOI
|