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Assessing the effect of stylus tip radius on surface roughness measurement by accumulation spectral analysis  

Kwon Ki-Hwan (Packaging Center, Samsung Advanced Institute of Technology)
Cho Nahm-Gyoo (School of Mechanical Engineering, Hanyang University)
Publication Information
International Journal of Precision Engineering and Manufacturing / v.7, no.1, 2006 , pp. 9-12 More about this Journal
Abstract
A spectral analysis and numerical simulation are employed to assess the effects of the stylus tip radius on measuring surface profiles. Original profiles with fractal spectral densities are generated and then are numerically traced with circular tipped stylus. Instead of their spectral densities, the accumulative power spectrums of traced profiles are analyzed. It is shown that the minimum wavelength of traced profile relates directly to the radius r of the stylus tip and the root-mean-square (rms) roughness ${\sigma}_o$ of original profile. From this accumulation spectral analysis, a formula is developed to estimate the minimum wavelength of traced profile. By using the concept of the minimum wavelength, an appropriate stylus tip radius can be chosen for the given rms roughness ${\sigma}_o$ of the profile.
Keywords
Measurement; Surface roughness; Stylus profiler; Spectral analysis;
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