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http://dx.doi.org/10.33961/jecst.2019.00283

Manufacturing of Copper(II) Oxide Powder for Electroplating from NaClO3 Type Etching Wastes  

Hong, In Kwon (Department of Chemical Engineering, Dankook University)
Lee, Seung Bum (Department of Chemical Engineering, Dankook University)
Kim, Sunhoe (Department of New Energy & Resource Engineering, Sangji University)
Publication Information
Journal of Electrochemical Science and Technology / v.11, no.1, 2020 , pp. 60-67 More about this Journal
Abstract
In this study, copper (II) oxide powder for electroplating was prepared by recovering CuCl2 from NaClO3 type etching wastes via recovered non-sintering two step chemical reaction. In case of alkali copper carbonate [mCuCo3·nCu(OH)2], first reaction product, CuCo3 is produced more than Cu(OH)2 when the reaction molar ratio of sodium carbonate is low, since m is larger than n. As the reaction molar ratio of sodium carbonate increased, m is larger than n and Cu(OH)2 was produced more than CuCO3. In the case of m has same values as n, the optimum reaction mole ratio was 1.44 at the reaction temperature of 80℃ based on the theoretical copper content of 57.5 wt. %. The optimum amount of sodium hydroxide was 120 g at 80℃ for production of copper (II) oxide prepared by using basic copper carbonate product of first reaction. At this time, the yield of copper (II) oxide was 96.6 wt.%. Also, the chloride ion concentration was 9.7 mg/L. The properties of produced copper (II) oxide such as mean particle size, dissolution time for sulfuric acid, and repose angle were 19.5 mm, 64 second, and 34.8°, respectively. As a result of the hole filling test, it was found that the copper oxide (II) prepared with 120 g of sodium hydroxide, the optimum amount of basic hydroxide for copper carbonate, has a hole filling of 11.0 mm, which satisfies the general hole filling management range of 15 mm or less.
Keywords
Copper(II) Oxide; $NaClO_3$ Type Etching Wastes; Electroplating; Via-Filling Plating;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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