Effect of [Al(DMSO2)3]3+ Concentration on Al Electrodeposition from AlCl3/Dimethylsulfone Baths |
Kim, Sangjae
(Department of Materials Science & Engineering, Graduate School of Engineering, Nagoya University)
Matsunaga, Naoya (Department of Materials Science & Engineering, Graduate School of Engineering, Nagoya University) Kuroda, Kensuke (Institute of Materials and Systems for Sustainability, IMaSS, Nagoya University) Okido, Masazumi (Institute of Materials and Systems for Sustainability, IMaSS, Nagoya University) |
1 | L. Legrand, A. Tranchant, R. Messina, J. Electrochem. Soc., 1994, 141(2), 378-382. DOI |
2 | L. Legrand, A. Tranchant, R. Messina, F. Romain, A. Lautie, Inorg. Chem., 1996, 35(5), 1310-1312. DOI |
3 | M. Miyake, H. Motonami, T. Hirato, ISIJ Int., 2012, 52(12), 2273-2277. DOI |
4 | S. Shiomi, M. Miyake, T. Hirato, J. Electrochem. Soc., 2012, 159(4), D225-D229. DOI |
5 | L. Legrand, M. Heintz, A. Tranchant, R. Messina, Electrochim. Acta, 1995, 40(11), 1711-1716. DOI |
6 | Gaylord Chemical Company, L.L.C, Dimethyl Sulfone() Physical Properties, 2007. |
7 | J. P. Pereira-Ramos, R. Messina, J. Perichon, J. Electroanal. Chem., 1986, 209(2), 283-296. DOI |
8 | C. Charrier, P. Jacquot, E. Denisse, J. P. Millet, H. Mazille, Surf. Coat Technol., 1997, 90(1-2), 29-34. DOI |
9 | M. Campo, M. Carboneras, M. D. Lopez, B. Torres, P. Rodrigo, E. Otero, J. Rams, Surf. Coat Technol., 2009, 203(20-21), 3224-3230. DOI |
10 | R. S. C. Paredes, S. C. Amico, A. S. C. M. d'Oliveira, Surf. Coat Technol., 2006, 200(9), 3049-3055. DOI |
11 | M. Galova, Surf. Technol., 1980, 11(5), 357-369. DOI |
12 | Y. Zhao, T. J. VanderNoot, Electrochim. Acta, 1997, 42(11), 1639-1643. DOI |
13 | H. Lehmkuhl, K. Mehler, U. Landau, The Principles and Techniques of Electrolytic Aluminum Deposition and Dissolution in Organoaluminum Electrolytes. In:Gerischer H, Tobias CW (Eds.) Advances in Electrochemical Science and Engineering, Vol 3, VCH Verlagsgesellschaft, Weinheim, 1990. |
14 | W. Simka, D. Puszczyk, G. Nawrat, Electrochim. Acta, 2009, 54(23), 5307-5319. DOI |
15 | S. Takahashi, K. Akimoto, I. Saeki, J. Surf. Finish Soc. Jpn., 1989, 40, 134-135. |
16 | S. Z. El Abedin, E. M. Moustafa, R. Hempelmann, H. Natter, F. Endres, Electrochem. Comm., 2005, 7(11), 1111-1116. DOI |
17 | J. K. Chang, S. Y. Chen, W. T. Tsai, M. J. Deng, I. W. Sun, Electrochem. Comm., 2007, 9(7), 1602-1606. DOI |
18 | F. Endres, A. P. Abbott, D. R. MacFarlane, Electrodeposition from Ionic Liquids. Wiley-VCH, Weinheim, 2008. |
19 | L. Barchi, U. Bardi, S. Caporali, M. Fantini, A. Scrivani, A. Scrivani, Prog. Org. Coat, 2010, 67(2), 146-151. DOI |
20 | A. P. Abbott, F. Qiu, H. Abood, M. Ali, K. Ryder, Phys. Chem. Chem. Phys., 2010, 12(8), 1862-1872. DOI |
21 | A. R. Brukin, Production of Aluminium and Alumina, Critical Reports in Applied Chemistry, Vol. 20, John Wiley, 1987. |
22 | W. Deqing, S. Ziyuan, Z. Longjiang, Appl. Surf. Sci., 2003, 214(1-4), 304-311. DOI |
23 | Y. Liu, L. J. Overzet, M. J. Goeckner, Thin Solid Films, 2006, 510(1-2), 48-54. DOI |
24 | J. F. Hinton and R. W. Briggs, NMR and the Periodic Table, R. K. Harris and B. E. Mann, Eds., Academic Press, 1978. |
25 | L. Legrand, A. Tranchant, R. Messina, Electrochim. Acta, 1996, 41(17), 2715-2720. DOI |
26 | J. P. Cornard, J. C. Merlin, J. Inorg. Biochem., 2002, 92(1), 19-27. DOI |
27 | A. Endo, M. Miyake, T. Hirato, Electrochim. Acta, 2014, 137, 470-475. DOI |
28 | J. W. Akitt, Annu. Rep. NMR Spectrosc., 1972, 5, 465-556. |
29 | N. A. Pangarov, J. Electroanal. Chem., 1965, 9(1), 70-85. DOI |
30 | J. J. Dechter, Prog. Inorg. Chem., 1982, 29, 285-385. |
31 | M. Miyake, H. Motonami, S. Shiomi, T. Hirato, Surf. Coat. Technol., 2012, 206(19-20), 4225-4229. DOI |
32 | B. J. Lindberg, K. Hamrin, G. Johansson, U. Gelius, A. Fahlmann, C. Nordling, K. Siegbahn, Phys. Scr., 1970, 1(5-6), 286. DOI |
33 | J. F. Moulder, W. F. Stickle, P. E. Sobol, K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data, 1995. |
34 | V. G. Bhide, S. Salkalachen, A. C. Rastogi, C. N. R. Rao, M. S. Hegde, J. Phys. D: Appl. Phys., 1981, 14(9), 1647. DOI |
35 | B. R. Strohmeier, D. M. Hercules, J. Catal., 1984, 86(2), 266-279. DOI |
36 | A. P. Abbott, C. A. Eardley, N. R. S. Farley, G. A. Griffith, A. Pratt, J. Appl. Electrochem., 2001, 31(12), 1345-1350. DOI |
37 | S. Shiomi, M. Miyake, T. Hirato, A. Sato, Mater. Trans., 2011, 52(6), 1216-1221. DOI |
38 | Q. Liao, W. R. Pitner, G. Stewart, C. L. Hussey, G. R. Stafford, J. Electrochem. Soc., 1997, 144(3), 936-943. DOI |
39 | F. H. Hurley, T. P. Wier, J. Electrochem. Soc., 1951, 98(5), 207-212. DOI |
40 | T. Hirato, J. Fransaer, J.-P. Celis, J. Electrochem. Soc., 2001, 148(4), C280-C283. DOI |
41 | M. Miyake, S. Tajikara, T. Hirato, High Temp. Mater. Processes, 2011, 30(4-5), 485-489. |
42 | M. Miyake, S. Tajikara, T. Hirato, Surf. Coat Tech., 2011, 205(21-22), 5141-5146. |
43 | T. Jiang, M. J. C. Brym, G. Dube, A. Lasia, G. M. Brisard, Surf. Coat Tech., 2007, 201(14), 6309-6317. DOI |