1 |
Analysis of Channel Doping Profile Dependent Threshold Voltage Characteristics for Double Gate MOSFET
/ [Jung, Hak-Kee;Han, Ji-Hyung;Lee, Jae-Hyung;Jeong, Dong-Soo;Lee, Jong-In;Kwon, Oh-Shin;] / Journal of the Korea Institute of Information and Communication Engineering
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2 |
Analysis of Subthreshold Characteristics for Device Parameter of DGMOSFET Using Gaussian Function
/ [Jung, Hak-Kee;] / Journal of information and communication convergence engineering
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3 |
Analysis of Subthreshold Swing for Oxide Thickness and Doping Distribution in DGMOSFET
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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4 |
Relation of Short Channel Effect and Scaling Theory for Double Gate MOSFET in Subthreshold Region
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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5 |
Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Concentration
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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6 |
Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET Using Gaussian Distribution
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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7 |
The Analysis of Breakdown Voltage for the Double-gate MOSFET Using the Gaussian Doping Distribution
/ [Jung, Hak-Kee;] / Journal of information and communication convergence engineering
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8 |
Analysis of Subthreshold Swings Based on Scaling Theory for Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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9 |
Relation of Threshold Voltage and Scaling Theory for Double Gate MOSFET
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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10 |
Subthreshold Characteristics of Double Gate MOSFET for Gaussian Function Distribution
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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11 |
Device Characteristics and Hot Carrier Lifetime Characteristics Shift Analysis by Carbon Implant used for Vth Adjustment
/ [Mun, Seong-Yeol;Kang, Seong-Jun;Joung, Yang-Hee;] / Journal of information and communication convergence engineering
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12 |
Analysis of Subthreshold Characteristics for Double Gate MOSFET using Impact Factor based on Scaling Theory
/ [Jung, Hak-Kee;] / Journal of the Korea Institute of Information and Communication Engineering
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13 |
Deviation of Threshold Voltages for Conduction Path of Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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14 |
Analysis for Breakdown Voltage of Double Gate MOSFET according to Device Parameters
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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15 |
Analysis of Threshold Voltage and DIBL Characteristics for Double Gate MOSFET Based on Scaling Theory
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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16 |
Relation between Conduction Path and Breakdown Voltages of Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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17 |
Breakdown Voltages Deviation for Channel Dimension of Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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18 |
Analysis of Subthreshold Current Deviation for Channel Doping of Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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19 |
Analysis of Subthreshold Current Deviation for Channel Doping of Double Gate MOSFET
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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20 |
Analysis of Breakdown Voltages of Double Gate MOSFET Using 2D Potential Model
/ [Jung, Hakkee;] / Journal of the Korea Institute of Information and Communication Engineering
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