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http://dx.doi.org/10.1007/BF02706814

Fabrication of high aspect ratio nanostructures using capillary force lithography  

Seo, Kap-Yang (서울대학교)
Kim, Jae-Kwan (서울대학교)
Lee, Seong-Hun (서울대학교)
Jeong, Hoon-Eui (서울대학교)
Park, Jee-Won (서울대학교)
Publication Information
Korean Journal of Chemical Engineering / v.23, no.4, 2006 , pp. 678-682 More about this Journal
Abstract
(MINS101m, Minuta Tech.) has recently been introduced as an alternative to replace polydimethylsiloxane (PDMS)mold for sub-10-nm lithography. Here, we demonstrate that this mold allows for fabrication of various high aspectratio nanostructures with an aspect ratio as high as 4.4 for 80 nm nanopillars. For the patterning method, we used cap-illary force lithography (CFL) involving direct placement of a polyurethane acrylate mold onto a spin-coated polymerfilm followed by raising the temperature above the glass transition temperature of the polymer (Tg). For the patterningmaterials, thermoplastic resins such as polystyrene (PS) and poly(methyl methacrylate) (PMMA) and a zinc oxideapplication of the same method, which is potentially useful for mimicking functional surfaces such as lotus leaf.
Keywords
Capillary Force Lithography; Nanostructures; Aspect Ratio; Laplace Pressure;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By Web Of Science : 3  (Related Records In Web of Science)
Times Cited By SCOPUS : 3
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1 Brandup, J. and Immergm, E. H., Polymer Handbook, Wiley, New York (1989)
2 Choi, K. M. and Rogers, J. A, 'A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime', J. Am. Chem. Soc., 125, 4060 (2003)   DOI   ScienceOn
3 Feng, J., Li, S. H., Li, Y. S., Li, H. J., Zhang, J. J., Zhai, J., Song, Y. L., Liu, B. Q., Jiang, L. and Zhu, D. B., 'Super-hydrophobic surfaces: From natural to artificial', Adv. Mater., 14, 1857 (2002)   DOI   ScienceOn
4 Haes, A. J. and Van Duyne, R. P., 'A nanoscale optical biosensor: Sensitivity and selectivity of an approach based on the localized surface plasmon resonance spectroscopy oftriangular silver nanoparticles', J. Am. Chem. Soc., 124, 10596 (2002)   DOI   ScienceOn
5 Hehn, M., Ounadjela, K., Bucher, J. P., Rousseaux, E., Decanini, D., Bartenlian, B. and Chappert, C., 'Nanoscale magnetic domains in mesoscopic magnets', Science, 272, 1782 (1996)   DOI
6 Khang, D. Y., Kang, H., Kim, J. and Lee, H. H., 'Low-pressure nanoimprint lithographY,' Nano. Lett., 4, 633 (2004)   DOI   ScienceOn
7 Khang, D. Y and Lee, H. H., 'Pressure-assisted capillary force lithography', Adv. Mater., 16, 176 (2004)   DOI   ScienceOn
8 Lee, K. B., Kim, D. J., Yoon, K. R., Kim, Y. and Choi, I. S., 'Patteming Si by using surface fimctionaIization and microcontact printing with a polymeric ink', Korean J. Chem. Eng., 20, 956 (2003)   DOI   ScienceOn
9 Schmid, H. and Michel, B., 'Siloxane polymers for high-resolution, highaccuracy soft lithography', Macromolecules, 33, 3042 (2000)   DOI   ScienceOn
10 Suh, K. Y. and Lee, H. H., 'Capillary force lithography: Large-area patteming, self-organization, and anisotropic dewetting', Adv. Funct. Mater., 12, 405 (2002)   DOI   ScienceOn
11 Wanke, M. C., Lehmann, O., Muller, K., Wen, Q. Z. and Stuke, M., 'Laser rapid prototyping ofphotonic band-gap microstructures', Science, 275, 1284 (1997)   DOI
12 Suh, K. Y., Langer, R. and Lahann, J., 'Fabrication ofelastomeric stamps with polymer-reinforced sidewalls via chemically selective vapor deposition polymerization of poly(p-xylylene)', Appl. Phys. Lett., 83, 4250 (2003)   DOI   ScienceOn
13 Cheng, J. Y., Ross, C. A., Chan, V. Z. H., Thomas, E. J., Lammertink, R. G. H. and Vancso, G. J., 'Fonnation ofa cobalt magnetic dot array via block copolymer lithography', Adv. Mater., 13, 1174 (2001)   DOI   ScienceOn
14 Neinhuis, C. and Barthlott, W., 'Characterization and distribution of water-repellent, self-cleaning plant surfaces', Ann. Bot., 79, 667 (1997)   DOI   ScienceOn
15 Choy, J. H., Jang, E. S., Won, J. H., Chung, J. H., Jang, D. J. and Kim, Y. W., 'Soft solution route to directionally grown ZnO nanorod arrays on Si wafer', room-temperature ultraviolet laser', Adv. Mater., 15, 1911 (2003)   DOI   ScienceOn
16 Krauss, P. R. and Chou, S. Y., 'Nano-compact disks with 400 Gbit/in(2) storage density fabricated using nanoimprint lithography and read with proximal probe', Appl. Phys. Lett., 71, 3174 (1997)   DOI   ScienceOn
17 Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Imprint lithography with 25-nanometer resolution', Science, 272, 85 (1996)   DOI   ScienceOn
18 Sea, S. M., Park, J. Y. and Lee, H. H., 'Micropatteming of metal substrate by adhesive force lithography', Appl. Phys. Lett., 86, (2005)
19 Xia, Y. N. and Whitesides, G. M., 'Soft lithography', Annu. Rev. Mater. Sci., 28, 153 (1998)   DOI   ScienceOn
20 Lee, K, B., Park, S., Mirkin, C. A., Smith, J. C. and Mrksich, M., 'Protein nanoarrays generated by dip-pen nanolithography', Science, 295, 1702 (2002)   DOI   ScienceOn
21 Bietsch, A. and Michel, B., 'Confonnal contact and pattern stability of stamps used for soft lithographY', J. Appl. Phys., 88, 4310 (2000)   DOI   ScienceOn
22 Ball, P., 'Engineering - Shark skin and other solutions', Nature, 400, 507 (1999)   DOI
23 Choi, S. J., Yoo, P. J., Baek, S. J., Kim, J. W. and Lee, H. H., 'An ultraviolet curable mold for sub-100nm lithography', J. Am. Chem. Soc., 126, 7744 (2004)   DOI   ScienceOn
24 Kim, Y. S., Suh, K. Y. and Lee, H. H., 'Fabrication of three-dimensional microstructures by soft molding', Appl. Phys. Lett., 79, 2285 (2001)   DOI   ScienceOn
25 Csucs, G., Kunzler, J., Feldman, K., Robin, F. and Spencer, N. D., 'Microcontact printing ofmacromolecules with submicrometer resolution by means of polyolefin stamps', Langmuir, 19, 6104 (2003)   DOI   ScienceOn
26 Odom,T. W., Love, J. C., Wolfe, D. B., Paul, K. E. and Whitesides, G. M., 'Improved pattern transfer in soft lithography using composite stamps', Langmuir, 18, 5314 (2002)   DOI   ScienceOn
27 Poborchii, V. V., Tada, T. and Kanayama, T., 'A visible-near infrared range photonic crystal made up of Si nanopillars', Appl. Phys. Lett., 75, 3276 (1999)   DOI
28 Kim, Y. S., Lee, H. H. and Hammond, P. T., 'High density nanostructure transfer in soft molding using polyurethane acrylate molds and polyelectrolyte multilayers', Nanotechnology, 14, 1140 (2003)   DOI   ScienceOn
29 Delamarche, E., Schmid, H., Michel, B. and Biebuyck, H., 'Stability of molded polydimethylsiloxane microstructures', Adv. Mater., 9, 741 (1997)   DOI   ScienceOn
30 Yang, S. M. and Ozin, G. A., 'Opal chips: vectorial growth ofcolloidal crystal patterns inside silicon wafers', Chem. Comm., 24, 2507 (2000)
31 Suh, K. Y., Kim, Y. S. and Lee, H. H., 'Capillary force lithography,' Adv. Mater., 13, 1386 (2001)   DOI   ScienceOn
32 Wu, S., Polymer Interface andAdhesion, Dekker, New York (1982)