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The Effect of Etching on Low-stress Mechanical Properties of Polypropylene Fabrics under Helium/Oxygen Atmospheric Pressure Plasma  

Hwang, Yoon J. (Department of Textile Engineering, Chemistry and Science, College of Textiles, North Carolina State University)
An, Jae Sang (Apparel ＆ Sweater Technical Service Center, Korea Institute of Industrial Technology)
McCord, Marian G. (Department of Textile Engineering, Chemistry and Science, College of Textiles, North Carolina State University)
Park, Shin Woong (Department of Textile Engineering, Inha University)
Kang, Bok Choon (Department of Textile Engineering, Inha University)
Publication Information
Fibers and Polymers / v.4, no.4, 2003 , pp. 145-150 More about this Journal
Abstract
Polypropylene nonwoven fabrics were exposed to He/$O_2$ atmospheric pressure glow discharge plasma. Surface chemical analysis and contact angle measurement revealed the surface oxidation by formation of new functional groups after plasma treatment. Weight loss (%) measurement and scanning electron microscopy analysis showed a significant plasma etching effect. It was investigated in low-stress mechanical properties of the fabrics using Kawabata Evaluation System (KES-FB). The surface morphology change by plasma treatment increased surface friction due to an enhancement of fiber-to-fiber friction, resulting in change of other low-stress mechanical properties of fabric.
Keywords
Atmospheric pressure plasma; KES-FB; XPS; SEM; Polypropylene;
Citations & Related Records

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