Browse > Article

Conformal $Al_2$O$_3$ Nanocoating of Semiconductor Nanowires by Atomic Layer Deposition  

Hwang, Joo-Won (Dept. of Electrical Engineering, Korea University)
Min, Byung-Don (Dept. of Electrical Engineering, Korea University)
Kim, Sang-Sig (Dept. of Electrical Engineering, Korea University)
Publication Information
KIEE International Transactions on Electrophysics and Applications / v.3C, no.2, 2003 , pp. 66-69 More about this Journal
Abstract
Various semiconductor nanowires such as GaN, GaP, InP, Si$_3$N$_4$, SiO$_2$/Si, and SiC were coated conformally with aluminum oxide (Al$_2$O$_3$) layers by atomic layer deposition (ALD) using trimethylaluminum (TMA) and distilled water ($H_2O$) at a temperature of 20$0^{\circ}C$. Transmission electron microscopy (TEM) revealed that A1203 cylindrical shells conformally coat the semiconductor nanowires. This study suggests that the ALD of $Al_2$O$_3$ on nanowires is a promising method for preparing cylindrical dielectric shells for coaxially gated nanowire field-effect transistors.
Keywords
nanowire; atomic layer deposition (ALD); Al$_2$O$_3$ coating;
Citations & Related Records
연도 인용수 순위
  • Reference
1 H. W. Seo, S. Y. Bae, J. Park, H. Yang, and S. Kim, Chem. Commun. 2564 (2002)
2 Y. widjaja and C. B. Musgrave, Appl. Phys. Lett. 80, 3304 (2002)
3 W. S. Yang, Y. K. Kim, S. Y. Yang, J. H. Choi, H. S. Park, S. I. Lee, and J. B. Yoo. Surface and Coatings Technology 131,79 (2000)
4 H. W. Seo, S. Y. Bae, J. Park, H. Yang, K. S. Park, and S. Kim, J. Chem. Phys. 116, 9492 (2002)
5 J. W. Elam, Z. A. Sechrist, and S. M. George, Thin-Solid Films 414, 43 (2002)
6 L. J. Lauhon, M. S. Gudiksen, D. Wang, and C. M. Lieber, Nature 420, 57 (2002)
7 H. Iizuka, K. Yokoo, and S. Ono, Appl. Phys. Lett. 61, 2978 (1992)
8 M. Juppo, A. Rahtu, M. Ritala, and Leskela, Langmuir 16, 4034 (2000)
9 H. Gumagai, M. Matsumoto, K. Toyoda, M. Obara, and M. Suzuki, Thin Solid Films 263, 47 (1995)
10 B. Lux, C. Colombier, H. Altena, and K. Stjernberg, Thin Solid Films 138,49 (1986)
11 M. D. Groner, J. W. Elam, F. H. Fabreguette, and S. M. George, Thin Solid Films 414,43 (2002)
12 A. W. Ott, K. C. McCarley, J. W. Klaus, J. D. Way, and S. M. George, Appl. Surf. Sci. 107, 128 (1996)
13 K. Park, J. S. Lee, M. Y. Sung, and S. Kim, jpn. J. Appl. Phys. 41,7317 (2002)
14 A. Paranjpe, S. Gopinath, T. Omstead, and R. Bubber, J. Electrochem. Soc. 148, G465 (2001)
15 A. Yamada, B. Sang, and M. Konagai, Appl. Surf. Sci. 112, 216 (1997)
16 Y. Kim, S. M. Lee, C. S. Park, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. 71, 3604 (1997)
17 J. W. Klaus, A. W. Ott, A. C. Dillon, and S. M. George, Surf. Sci. 418, L14 (1998)
18 H. Y. Kim, J. Park, and H. Yang, Chem. Commun. 256 (2003)