Deposition of Cu-Ni films by Magnetron Co-Sputtering and Effects of Target Configurations on Film Properties |
Seo, Soo-Hyung
(Crystal Growyh Division, NeosemiTech Corporation)
Park, Chang-Kyun (Department of Electrical Engineering, Hanyang Yniversity) Kim, Young-Ho (Department of Electronic Materials, Suwon University) Park, Jin-Seok (Department of Electrical Engineering, Hanyang Yniversity) |
1 | H. Konishi, T. Suzuki, and M. Utsunomiya, 'Constantan thin film strain gauge load cell,' Tech. Digest of the 9th Sensor Symposium, pp. 149-152, 1990 |
2 | H. Hiramatsu, W. S. S대, and K. Koumoto, 'Electrical and optical properties of radio-frequency-sputtered thin films of ,' Chemical Materials, vol 10, pp. 3033-3039, 1998 |
3 | B. D. Cullity, Elements of X-ray Diffraction, 2nd ed., Addison-Wesley Pub., 1978, pp. 81-106 |
4 | F. Spaepen, 'Interfaces and stresses in thin films,' Actuator Material., vol. 48, pp. 31-42, 2000 |
5 | L. Sanques, S. Fagnent, M. C. S. Catherine, and C. Sella, 'Aluminium-aluminium nitride cermet films: preparation by co-sputtering and microstructure,' Surface Coating Technology, vol. 102, pp. 25-34, 1998 |
6 | F. O. Adurodija, J. S. Song, S. D. Kim, S. K. Kim, and K. H. Yoon, 'Characterization of CuIn thin films grown by close-spaced vapor sulfurization of cosputtered Cu-In alloy precursors,' Japan J Applied Physics, vol. 37, pp. 4248-4253, 1998 |
7 | I. mizushima, M. Chikazawa, and T. Watanabe, 'Microstructure of electrodeposited Cu-Ni binary alloy films,' J. Electrochemical Society, vol. 143, no. 6, pp. 1978-1983, 1996 |
8 | R. H. Horng, D. S. Wun, L. H. Wu, M. K. Lee, S. H. Chan, C. C. Leu, T.Y. Huang, and S. M. Sze, 'Thermal stability of co-sputtered Ru-Ti alloy electrodes for dynamic random access memory applications,' Japan J Applied Physics, vol.37, pp. L1247-L1250, 1998. |