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http://dx.doi.org/10.14773/cst.2013.12.4.163

Determining Factors for the Protectiveness of the Passive Film of FeCrN Stainless Steel Formed in Sulfuric Acid Solutions  

Ha, Heon-Young (Advanced Metallic Materials Division, Korea Institute of Materials Science)
Lee, Tae-Ho (Advanced Metallic Materials Division, Korea Institute of Materials Science)
Publication Information
Corrosion Science and Technology / v.12, no.4, 2013 , pp. 163-170 More about this Journal
Abstract
In NaCl solutions acidified with $H_2SO_4$, Fe20Cr1.1N alloy showed enhanced pitting corrosion resistance than Fe20Cr alloy. An XPS analysis revealed that the passive film of Fe20Cr1.1N alloy contained higher cationfraction of Cr than that of Fe20Cr alloy, and nitrogen was incorporated into the film. In addition, it was found that the passive film of Fe20Cr1.1N alloy was thinner and had higher oxygen vacancy density than that of Fe20Cr alloy. Based on these observations, it was concluded that the chemical composition was the determining factor for the protectiveness of the passive film of Fe20Cr based alloy in dilute $H_2SO_4$ solution.
Keywords
stainless steel; nitrogen; sulfuric acid solution; passive film; Mott-Schottky; XPS;
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1 R. F. A. J.-Pettersson, Corros. Sci., 41, 1639 (1999).   DOI   ScienceOn
2 E. Cho, H. Kwon and D. D Macdonald, Electrochim. Acta, 47, 1661 (2002).   DOI   ScienceOn
3 P. J. Uggowitzer, R. Magdowski and M. O. Speidel, ISIJ Int., 36, 901 (1996).   DOI   ScienceOn
4 P. R. Levey and A. van Bennekom, Corrosion, 51, 911 (1995).   DOI
5 M. Sumita, T. Hanawa and S. H. Teoh, Mat. Sci. Eng. C-Mater., 24, 753 (2004).   DOI   ScienceOn
6 H. J. Grabke, ISIJ Int., 36, 777 (1996).   DOI   ScienceOn
7 J. W. Simmons, Mat. Sci. Eng. A-Struct., 207, 159 (1996).   DOI   ScienceOn
8 K. H. Lo, C. H. Shek and J. K. L. Lai, Mat. Sci. Eng. R, 65, 39 (2009).   DOI   ScienceOn
9 I. Olefjord and L. Wegrelius, Corros. Sci., 38, 1203 (1996).   DOI   ScienceOn
10 H. Ha, H. Jang and H. Kwon, Corros. Sci., 51, 48 (2009).   DOI   ScienceOn
11 M. K. Lei and X. M. Zhu, J. Electrochem. Soc., 152, B291 (2005).   DOI   ScienceOn
12 R. D. Willenbruch, C. R. Clayton, M. Oversluizen, D. Kim and Y. Lu, Corros. Sci., 31, 179 (1990).   DOI   ScienceOn
13 C.-O. A. Olsson, Corros. Sci., 37, 467 (1995).   DOI   ScienceOn
14 S. Ahn and H. Kwon, J. Electroanal. Chem., 579, 311 (2005).   DOI   ScienceOn
15 Y. Fu, X. Wu, E.-H. Han, W. Ke, K. Yang and Z. Jiang, Electrochim. Acta, 54, 4005 (2009).   DOI   ScienceOn
16 S. Ningshen, U. K. Mudali, V. K. Mittal and H. S. Khatak, Corros. Sci., 49, 481 (2007).   DOI   ScienceOn
17 K. N. Goswami and R. W. Staehle, Electrochim. Acta, 16, 1895 (1971).   DOI   ScienceOn
18 H.-Y. Ha and H.-S. Kwon, J. Electrochem. Soc., 159, C416 (2012).   DOI
19 H.-Y. Ha, T.-H. Lee and S.-J. Kim, Electrochim. Acta, 80, 432 (2012).   DOI   ScienceOn
20 T. Massoud, V. Maurice, L. H. Klein and P. Marcus, J. Electrochem. Soc., 160, C232 (2013).   DOI   ScienceOn
21 H. Luo, X. G. Li, C. F. Dong and K. Xiao, Surf. Interface Anal., 45, 793 (2013).   DOI   ScienceOn
22 A. Kocijan, C. Donik and M. Jenko, Corros. Sci., 49, 2083 (2007).   DOI   ScienceOn
23 N. Sato, K. Kudo and T. Noda, Electrochim. Acta, 16, 1909 (1971).   DOI   ScienceOn
24 N. Li, Y. Li, S. Wang and F. Wang, Electrochim. Acta, 52, 760 (2006).   DOI   ScienceOn
25 N. Sato, K. Kudo and R. Nishimura, J. Electrochem. Soc., 123, 1419 (1976).   DOI
26 A. M. P. Simoes, M. F. S. Ferreira, B. Rondot and M. Da Cunha Belo, J. Electrochem. Soc., 137, 82 (1990).   DOI
27 S. Ahn, H. Kwon and D. D. Macdonald, J. Electrochem. Soc., 152, B482 (2005).   DOI   ScienceOn
28 A. Shahryari, S. Omanovic and J. Z. Szpunar, Mat. Sci. Eng. C-Mater., 28, 94 (2008).   DOI   ScienceOn
29 M. Metikos-Hukovic, R. Babic, Z. Grubac, Z. Petrovic and N. Lajci, Corros. Sci., 53, 2176 (2011).   DOI   ScienceOn
30 A. S. Vanini, J.-P.Audouard and P. Marcus, Corros. Sci., 36, 1825 (1994).   DOI   ScienceOn
31 C. M. Abreu, M. J. Cristobal, P. Merino, X. R. Novoa, G. Pena and M. C. Perez, Electrochim. Acta, 53, 6000 (2008).   DOI   ScienceOn
32 J. Menzel, W. Kirschner and G. Stein, ISIJ Int., 36, 893 (1996).   DOI