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MOLECULAR SCALE MECHANISM ON EVAPORATION AND REMOVAL PROCESS OF ADHERENT MOLECULES ON SURFACE BY BURNT GAS  

Yang, Y.J. (Department of Automotive Engineering, Jinju National University)
Lee, C.W. (Department of Automotive Engineering, Jinju National University)
Kadosaka, O. (Chugai Ro Co., Ltd.)
Shibahara, M. (Department of Mechanical Engineering, Osaka University)
Katsuki, M. (Department of Mechanical Engineering, Osaka University)
Kim, S.P. (Department of Mechanical Engineering, Dong-A University)
Publication Information
International Journal of Automotive Technology / v.7, no.2, 2006 , pp. 121-128 More about this Journal
Abstract
The interaction between adherent molecules and gas molecules was modeled in the molecular scale and simulated by the molecular dynamics method in order to understand evaporation and removal processes of adherent molecules on metallic surface using high temperature gas flow. Methanol molecules were chosen as adherent molecules to investigate effects of adhesion quantity and gas molecular collisions because the industrial oil has too complex structures of fatty acid. Effects of adherent quantity, gas temperature, surface temperature and adhesion strength for the evaporation rate of adherent molecules and the molecular removal mechanism were investigated and discussed in the present study. Evaporation and removal rates of adherent molecules from metallic surface calculated by the molecular dynamics method showed the similar dependence on the surface temperature shown in the experimental results.
Keywords
Molecular dynamics method; Surface treatment; Adherent molecules; Evaporation; Burnt gas;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By Web Of Science : 0  (Related Records In Web of Science)
Times Cited By SCOPUS : 0
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