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Research on the WIP-based Dispatching Rules for Photolithography Area in Wafer Fabrication Industries  

Lin, Yu-Hsin (Department of Industrial Engineering and Management Ming-Hsin University of Science & Technology)
Tsai, Chih-Hung (Department of Industrial Engineering and Management Ta-Hwa Institute of Technology)
Lee, Ching-En (Chairman, AdvancedTEK International Corp.)
Chiu, Chung-Ching (Department of Industrial Engineering and Management Chin-Min Institute of Technology)
Publication Information
International Journal of Quality Innovation / v.8, no.2, 2007 , pp. 132-146 More about this Journal
Abstract
Constructing an effective production control policy is the most important issue in wafer fabrication factories. Most of researches focus on the input regulations of wafer fabrication. Although many of these policies have been proven to be effective for wafer fabrication manufacturing, in practical, there is a need to help operators decide which lots should be pulled in the right time and to develop a systematic way to alleviate the long queues at the bottleneck workstation. The purpose of this study is to construct a photolithography workstation dispatching rule (PADR). This dispatching rule considers several characteristics of wafer fabrication and influential factors. Then utilize the weights and threshold values to design a hierarchical priority rule. A simulation model is also constructed to demonstrate the effect of the PADR dispatching rule. The PADR performs better in throughput, yield rate, and mean cycle time than FIFO (First-In-First-Out) and SPT (Shortest Process Time).
Keywords
Wafer Fabrication; Photolithography; Dispatching Rule;
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