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Design of a Gate-VDD Drain-Extended PMOS ESD Power Clamp for Smart Power ICs  

Park, Jae-Young (Div. of Electronics and Computer Engineering, Hanyang University)
Kim, Dong-Jun (Div. of Electronics and Computer Engineering, Hanyang University)
Park, Sang-Gyu (Div. of Electronics and Computer Engineering, Hanyang University)
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Abstract
The holding voltage of the high-voltage MOSFETs in snapback condition is much smaller than the power supply voltage. Such characteristics may cause the latcup-like problems in the Smart Power ICs if these devices are directly used in the ESD (Electrostatic Discharge) power clamp. In this work, a latchup-free design based on the Drain-Extended PMOS (DEPMOS) adopting gate VDD structure is proposed. The operation region of the proposed gate-VDD DEPMOS ESD power clamp is below the onset of the snapback to avoid the danger of latch-up. From the measurement on the devices fabricated using a $0.35\;{\mu}m$ BCD (Bipolar-CMOS-DMOS) Process (60V), it was observed that the proposed ESD power clamp can provide 500% higher ESD robustness per silicon area as compared to the conventional clamps with gate-driven LDMOS (lateral double-diffused MOS).
Keywords
electrostatic discharge(EDS); gate-VDD; power clamp; latchup; Drain-Extended MOS;
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