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A Study on the High Efficiency PR Strip technology by using the Ozone Process  

Son, Young-Su (Intelligent & Precision Machinery Research Division, KIMM)
Publication Information
Journal of the Institute of Electronics Engineers of Korea SD / v.44, no.1, 2007 , pp. 22-27 More about this Journal
Abstract
we have been studied on the realization of the boundary layer controlled ozone process and related facilities in order to apply for the photo-resist strip process in the semiconductor and flat panel display manufacturing. By means of developing the technology for the high concentration ozone production, it was possible to realized the boundary layer control ozone process by vapor. As a result of the silicon wafer PR strip test, we obtained the strip rate of about 400nm/min at the ozone concentration of 16wt% and flow rate of 8[liter/min.].
Keywords
Photoresist; PR Strip Process; Boundary Layer Control; Ozone Process; Vapor Generator;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
연도 인용수 순위
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