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The RF performance degradation in Bulk DTMOS due to Hot Carrier effect  

Park Jang-Woo (Department of Electronic Engineering, Incheon University)
Lee Byoung-Jin (Department of Electronic Engineering, Incheon University)
Yu Jong-Gun (Department of Electronic Engineering, Incheon University)
Park Jong-Tae (Department of Electronic Engineering, Incheon University)
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Abstract
This paper reports the hot carrier induced RF performance degradation of bulk dynamic threshold voltage MOSFET (B-DTMOS) compared with bulk MOSFET (B-MOS). In the normal and moderate mode operations, the degradations of cut-off frequency $(f_{T})$ and minimum noise figure $(F_{min})$ of B-DTMOS are less significant than those of B-MOS devices. Our experimental results show that the RF performance degradation is more significant than the U performance degradation after hot carrier stressing. Also, the degradation characteristics of RF power Performance of B-DTMOS due to hot carrier effects are measured for the first time.
Keywords
Dynamic Threshold Voltage MOSFET; Bulk MOSFET; Hot carrier effects; RF performance; Device degradation;
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