Novel Ni-Silicide Structure Utilizing Cobalt Interlayer and TiN Capping Layer and its Application to Nano-CMOS |
오순영
(충남대학교 전자공학과)
윤장근 (충남대학교 전자공학과) 박영호 (충남대학교 전자공학과) 황빈봉 (충남대학교 전자공학과) 지희환 (충남대학교 전자공학과) 왕진석 (충남대학교 전자공학과) 이희덕 (충남대학교 전자공학과) |
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