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http://dx.doi.org/10.5370/KIEE.2012.61.1.089

Characteristics on Boundary Layer and Formation Mechanism of c-BN Thin Films During Electron Assisted Hot Filament CVD Process  

Choi, Yong (단국대 공대 신소재공학과)
Choe, Jean-I. (단국대 공대 신소재공학과)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.61, no.1, 2012 , pp. 89-93 More about this Journal
Abstract
c-BN films were deposited on SKH-51 steels by electron assisted hot filament CVD method and microstructure development was studied processing parameters such as bias voltage, temperature, etching and phase transformation at boundary layer between BN compound and steel to develop a high performance wear resistance tools. A negative bias voltage higher than 200V at substrate temperature of $800^{\circ}C$ and gas pressure of 20 torr in B2H6-NH3-H2 gas system was one of optimum conditions to produce c-BN films on the SKH-51 steels. Thin layer of hexagonal boron nitride phase was observed at the interface between c-BN layer and substrate.
Keywords
Cubic boron nitride phase; Electron assisted hot filament CVD; Bias voltage;
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