Browse > Article

The Study on Characteristics of Green Organic Light Emitting Device with Transparency Conductive Oxide Electrodes  

Ki, Hyun-Chul (한국과학기술원 광소자팀)
Kim, Seon-Hoon (한국과학기술원 광소자팀)
Kim, Hwe-Jong (한국과학기술원)
Kim, Sang-Gi ((주)링크라인아이엔씨)
Choi, Young-Sung (동신대학교 공대 전기공학과)
Hong, Kyung-Jin (광주대학교)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers P / v.58, no.4, 2009 , pp. 615-618 More about this Journal
Abstract
In order to apply for transparent conductive oxide(TCO), we deposited ZnO thin film on the glass at room temperature by RF magnetron sputtering method. Deposition conditions for low resistivity were optimized in our previous studies. Under the deposition condition with the RF power of 800 [W]. Sheet resistance and surface roughness of ITO and ZnO thin film were measured by Hall-effect measurement system and AFM, respectively. The sheet resistance of ITO and ZnO thin film were 7.290 [$\Omega$] and 4.882 [$\Omega$], respectively. and surface roughness were 3.634 [nm] and 0.491 [nm], respectively. Green OLED was fabricated with the structure of TPD(400 [$\AA$])/Alq3(600 [$\AA$])/LiF(5 [$\AA$])/Al(1200 [$\AA$]). Turn-on voltage of green OLED applied ITO was 7 [V] and luminance was 7,371 [$cd/m^2$]. And, Turn-on voltage of green OLED applied ZnO was 14 [V] and luminance was 6,332 [$cd/m^2$].
Keywords
Transparent Conductive Oxide; Green OLED; ZnO Thin Film;
Citations & Related Records
Times Cited By KSCI : 4  (Citation Analysis)
연도 인용수 순위
1 H. Jeon, V. P. Verma, K. Noh, D. -H. Kim, W.Choi, and M. Jeon, "Fabrication and Characteristics of Zinc Oxide- and Gallium doped Zinc Oxide thin film transistor using Radio Frequency Magnetron sputtering at Room Temperature" J. Kor. Vac. Soc., Vol. 16, pp.359-365, 2007   과학기술학회마을   DOI
2 C. C. Wu, C. I. Wu, J. C. Sturm, A. Kahn, "Surface modification of indium tin oxide by plasma treatment", Appl. phys., 70, p1348, 1997   DOI   ScienceOn
3 hydrogen and electricity from water and light. International Journal of Hydrogen Energy, pp.557–561, 1984   DOI   ScienceOn
4 J. F. Chang, H. L. Wang, M. H. Hon, "X-ray photoelectron spectroscopy investigation of substrate surface pretreatments for diamond nucleation by microwave plasma chemical vapor deposition", J. Crystal Growth, Vol.211, pp.211-215, 2000   DOI   ScienceOn
5 X. Jiang, F. L. Wong, M. K. Fung, S. T. Lee, "Aluminum-doped zinc oxide films as transparent conductive electrode for organic light-emitting devices", Appl. Phys. Lett. Vol. 83, pp.1875-1877, 2003   DOI   ScienceOn
6 S.H. Jeong, S.B. Lee and J. H. Boo, "The Insert of Zinc Oxide thin film in Indum tin oxide anode for organic electroluminescence devices", Current Applied Physics, Vol.4, pp.655-658, 2004   DOI   ScienceOn
7 H. Y. Yu, X. D. Feng, D. Grozea, Z. H. Lu, R. N. S. Sodhi, A-M. Hor, H. Aziz, "Surface electronic structure of plasma-treated indium tin oxides", J. Appl. Phys., 78, p2595, 2001
8 H. Kim and J. Kim, "Heat treatment effects on the electrical properties of In2O3-ZnO films prepared by rf-magnetron sputtering metho." J. Kor. Vac. Soc., Vol. 14, pp.238-244, 2005   과학기술학회마을
9 J. Lim, K. Shin and C. Lee, "ECR Plasma Pretreatment on Sapphire and Silicon Substrates for ZnO ALE", Kor. J. Mater. Res., Vol.14, pp.363-367, 2004   DOI   ScienceOn