1 |
Yutaka Ohya, Tsukasa Niwa, Takauki Ban, Yasutaka Takahashi, 'Thin Film Transistor of ZnO fabricated by Chemical Solution Deposition', Jpn. J. Appl. Phys., Vol.40, (2001) 297-298
DOI
|
2 |
S. Kobayashi, S. Nonomura, K. Abe, K. Ushikoshi, S. Nitta, 'Preparation of Field Effect Transistor using Nano-Crystalline GaN', J. Non-Cryst, Solids, Vol 227-230, (1998) 1245-1249
DOI
ScienceOn
|
3 |
L. Znaidi, G.J.A.A.Soler Illia, S. Benyahia, C. Sanchez, A.V. Kanaev, 'Tailoring of Room Temperature Excitonic Luminescence in Sol-Gel Zinc-Oxide Silica Nanocomposite Films', Thin Solid Films, Vol. 441 (2003), 228-237
DOI
ScienceOn
|
4 |
S.J. Henley, M.N.R. Ashfold, D. Chems, 'The oriented Growth of ZnO Films on NaCl Substrate by Pulsed Laser Ablation', Thin Solid Films, Vol.422 (2002), 69-72
DOI
ScienceOn
|
5 |
K. Haga, T. Suzuki, Y. Kashiwaba, H. Watanabe, B. P. Zhang and Y. Segawa, 'High-Quality ZnO Films prepared on Si Wafers by Low-Pressure MO-CVD', Thin Solid Films, Vol.433 (2003) 131-134
DOI
ScienceOn
|
6 |
Satoshi Masuda, Ken Kitamura, Yoshihiro Okumura, Shigehiro Miyatake, Hitoshi Tabata, Tomoji Kawai, 'Transparent Thin Film Transistors using ZnO as an active Channel Layer and their electrical Properties', J. Appl, Phys., Vol.93, No.3, (2003) 1624-1630
DOI
ScienceOn
|
7 |
Tamiko Ohshima, Tomoaki Ikegami, Kenji Ebihara, Ies Assmusen, Raj K. Thareja, 'Synthesis of p-Type ZnO Thin Films using Co-doping Techniques based on KrF Excimer Laser Deposition', Thin Solid Films, Vol.435 (2003) 49-55
DOI
ScienceOn
|
8 |
D.M. Bagnall, Y.F. Chan, Z. Zhu, T. Yao, S. Koyama, M.Y. Shen, T. Goto, 'Optically-pumped Lasing using ZnO at Room Temperature', Appl. Phys. Lett. Vol.70, No.17, (1997) 2230-2232
DOI
ScienceOn
|
9 |
S. Zafar, C.S. Ferekides, D.L. Morel, 'Characterization and Analysis of ZnO:Al deposited by Reactive Magnetron Sputtering', J. Vac. Sci. Technol' Vol.A13, No.4, (1995) 2177-2182
DOI
ScienceOn
|
10 |
Dengyuan Song, Dirk-Holger Neuhaus, James Xia, Arimin G. Aberle, 'Structure and Characteristics of ZnO:Al-nSi Heterojunctions prepared by Magnetron Sputtering', Thin Solid Films, Vol.422, (2002) 180-185
DOI
ScienceOn
|