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Electron Density Measurement of Inductively Coupled Plasma by Ar Gas Pressure  

이영환 (원광대 전자재료공학과)
김광수 (원광대 전자재료공학과)
조주웅 (원광대 전자재료공학과)
박대희 (원광대 전기전자 및 정보공학부)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.52, no.11, 2003 , pp. 508-511 More about this Journal
Abstract
In this paper, electrical characteristics of inductively coupled plasma in an electrodeless fluorescent lamp were investigated using a Langmuir probe with a variation of argon gas pressure. The RF output was applied in the range of 5 ∼ 50 (W) at 13.56 (MHz). The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100 (V) ∼+100 (V). When the pressure of argon gas was increased, electric current was decreased. There was a significant electric current increase from l0W to 30 〔W〕. Also, when the RF power was increased, electron density was increase. This implies that this method can be used to find an optimal RF rower for efficient light illumination in an electrodeless fluorescent lamp.
Keywords
Plasma diagnosis; Langmuir probe; Bias voltage; Electron density;
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Times Cited By KSCI : 1  (Citation Analysis)
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